High-power narrow-linewidth 1.94mum Tm: YLF (Yttrium Lithium Fluoride) laser

A technology with narrow line width and high power, applied in the structure/shape of optical resonators, etc., can solve problems such as difficult to achieve high-power laser output, and achieve the effect of compact structure, good stability, and narrow line width

Active Publication Date: 2012-12-26
HARBIN INST OF TECH
View PDF4 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problem that the existing 1.94μmTm:YLF laser is difficult to achieve high-power laser output, thereby providing a high-power narrow linewidth 1.94μmTm:YLF laser

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-power narrow-linewidth 1.94mum Tm: YLF (Yttrium Lithium Fluoride) laser

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0014] Specific implementation mode 1. Combination figure 1 Illustrate this specific embodiment, the 1.94 μm Tm:YLF laser device of high power narrow linewidth, it comprises volume grating 1, No. 1 total reflection mirror 2, No. 2 total reflection mirror 4, No. 3 total reflection mirror 6, No. 1 Tm:YLF Laser crystal 3, No. 2 Tm:YLF laser crystal 5, F-P etalon 7 and 1.94μm laser output coupling mirror 8;

[0015] The No. 1 pump light incident on the system is transmitted by the No. 1 total reflection mirror 2 and then enters the No. 1 Tm:YLF laser crystal 3. After being absorbed by the No. 1 Tm:YLF laser crystal 3, 1.94 μm laser radiation is generated, and the 1.94 μm laser is incident on the No. two total reflection mirror 4 obtains reflected light through No. two total reflection mirror 4 reflections, and described reflection light is incident to No. two Tm:YLF laser crystal 5, after No. two Tm:YLF laser crystal 5 transmits and is incident to No. three full reflection mirror ...

specific Embodiment approach 2

[0024] Embodiment 2. The difference between this embodiment and the high-power narrow-linewidth 1.94 μm Tm:YLF laser described in Embodiment 1 is that the volume grating 1 is coated with a 1.94 μm high-transparency film.

specific Embodiment approach 3

[0025] Embodiment 3. The difference between this embodiment and the high-power narrow linewidth 1.94 μm Tm:YLF laser described in Embodiment 1 is that the reflection wavelength of the volume grating 1 is 1940 nm, and the full width at half maximum of the reflection spectrum is less than 1 nm. .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a high-power narrow-linewidth 1.94mum Tm: YLF (Yttrium Lithium Fluoride) laser, relating to a solid laser and aiming at solving the problem that the traditional 1.94mumTm: YLF laser is difficult to realize high-power laser output. The high-power narrow-linewidth 1.94mum Tm: YLF laser comprises a volume grating, Tm: YLF laser crystals, 45-degree 1.94 mum totally-reflecting mirrors, an F-P etalon and a 1.94 mum laser output coupling mirror, wherein four beams of pumping light respectively pass through three 45-degree 1.94 mum totally-reflecting mirrors to enter two Tm: YLF laser crystals; the 45-degree 1.94 mum totally-reflecting mirror I is arranged behind the volume grating; the Tm: YLF laser crystal I is arranged behind the 45-degree 1.94 mum totally-reflecting mirror II; the 45-degree 1.94 mum totally-reflecting mirror II is arranged behind the Tm: YLF laser crystal I; the Tm: YLF laser crystal II is arranged behind the 45-degree 1.94 mum totally-reflecting mirror II; the 45-degree 1.94 mum totally-reflecting mirror III is arranged behind the Tm: YLF laser crystal II; the F-P etalon is arranged behind the 45-degree 1.94 mum totally-reflecting mirror III; and the 1.94 mum laser output coupling mirror is arranged behind the F-P etalon. The high-power narrow-linewidth 1.94mum Tm: YLF laser disclosed by the invention is suitable for providing 1.94 mum Tm: YLF laser with high power and narrow linewidth.

Description

technical field [0001] The invention relates to a solid-state laser. Background technique [0002] The 1.94μm laser is located near the strong absorption peak of water molecules and can be transmitted in optical fibers. Therefore, the laser in this wavelength band can be used as the light source of medical laser scalpels, and has important application value in laser medical treatment. Tm: YLF crystal has a strong gain near 1.94μm, which is suitable as a gain medium for generating 1.94μm laser. The free-running 1.94μm output spectrum is wide, and the output power is unstable, and it is sensitive to the influence of the external environment, so it is difficult to achieve high-power laser output. Contents of the invention [0003] The present invention aims to solve the problem that the existing 1.94μmTm:YLF laser is difficult to achieve high-power laser output, thereby providing a 1.94μmTm:YLF laser with high power and narrow line width. [0004] High-power narrow-linewidt...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01S3/08
Inventor 段小明鞠有伦姚宝权张云军王月珠
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products