Vacuum transfer apparatus for graphene and vacuum transfer method for graphene

Abstract

The invention provides vacuum transfer apparatus for graphene and a vacuum transfer method for the graphene. The vacuum transfer apparatus for the graphene comprises a shell, a lifting mechanism, a supporting convex platform and a heating device; the interior of the shell is provided with a vacuum chamber, the lifting mechanism is arranged in the shell and includes a pressure plate arranged in thevacuum chamber in a lifting manner, and a graphene film is fixed to the bottom of the pressure plate; the supporting convex platform is arranged in the vacuum chamber and located below the pressure plate, and a target substrate is fixed on the supporting convex platform; and the heating device is arranged in the vacuum chamber and connected with the supporting convex platform, and the heating device is used to heat the target substrate through the supporting convex platform. According to the vacuum transfer apparatus for the graphene provided by the invention, the graphene film is pressed downwards to the target substrate through the lifting mechanism and heated through the heating device, the graphene film is transferred to the target substrate, so that integrity of graphene transfer isimproved, water-oxygen doping of the graphene is reduced, and the apparatus and method have important application value.

Description

technical field [0001] The present disclosure relates to the field of graphene film transfer, in particular, to a vacuum graphene transfer device and method. Background technique [0002] As a two-dimensional material with a single atomic layer thickness, graphene has excellent mechanical, thermal, electrical, and optical properties, so it is considered to have good application prospects. At present, with the help of chemical vapor deposition, people can already grow large-area high-quality graphene films on metal substrates (such as copper). However, graphene can only be used in practical applications if it is transferred to specific functional substrates. [0003] At present, the steps of traditional wet etching transfer are generally as follows: (1) suspension-coating a layer of high polymer on the graphene grown on the metal substrate; Etching; (3) cleaning the etched graphene film; (4) using the target functional substrate to scoop up the graphene film, and then dryin...

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Problems solved by technology

[0004] This type of method has some shortcomings: during the transfer process, small bubbles are easy to remain on the lower surface of the graphene, which is difficult to remove, thus affecting the integrity of the transfer; at the same time, the integrity of different batches of graphene films varies greatly after removal; During the process, there is a relatively serious water and oxygen doping of graphene, which leads to a relatively serious shift of the Dirac point of graphene, which affects the electrical performance of the device.

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