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Power supply unit for generating plasma and plasma apparatus including the same

a power supply unit and plasma technology, applied in the field of plasma power supply units, can solve the problems of complex electric structure, deterioration of thin film properties, non-uniform voltage distribution, etc., and achieve the effect of improving the uniformity of the rf electric field

Inactive Publication Date: 2005-08-11
JUSUNG ENG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0016] An object of the present invention is to provide a power supply unit that supplies an RF power symmetrically to improve a uniformity of an RF electric field between a plasma electrode and a susceptor.

Problems solved by technology

In addition, an RF power leakage at a boundary of the plasma electrode 40 causes a non-uniformity of voltage distribution.
However, an electric structure becomes complicated or a property of a thin film is deteriorated.

Method used

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  • Power supply unit for generating plasma and plasma apparatus including the same
  • Power supply unit for generating plasma and plasma apparatus including the same
  • Power supply unit for generating plasma and plasma apparatus including the same

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Embodiment Construction

[0032] Reference will now be made in detail to the preferred embodiments, examples of which are illustrated in the accompanying drawings.

[0033] Since the present invention relates to a plasma apparatus such as a plasma enhanced chemical vapor deposition (PECVD) apparatus and an etcher where process gases are excited to a plasma state in a chamber and contact a substrate, the plasma apparatus may be a fabrication apparatus for a liquid crystal display (LCD) device or a semiconductor device. In addition, the substrate may be a glass substrate for an LCD device or a wafer for a semiconductor device.

[0034]FIG. 3 is a schematic cross-sectional view of a plasma apparatus according to an exemplary embodiment of the present invention.

[0035] In FIG. 3, a plasma apparatus includes a process chamber 10 having a susceptor (not shown) and a plasma electrode 40 therein and a radio frequency (RF) power source 50 connected to the plasma electrode 40 through an impedance matching box 60, a first ...

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Abstract

A power supply unit includes: a power source generating a radio frequency power; an impedance matching box connected to the power source and matching an internal impedance of the power source and a load impedance; a first feed line connected to the impedance matching box; a radio frequency distributing means connected to the first feed line; and a plasma electrode connected to the radio frequency distributing means, the radio frequency distributing means supplying the radio frequency power to a plurality of points of the plasma electrode.

Description

[0001] The present invention claims the benefit of Korean Patent Applications No. 2004-0008224 filed in Korea on Feb. 9, 2004 and No. 2005-0009453 filed in Korea on Feb. 2, 2005, each of which is hereby incorporated by reference. BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a power supply unit for generating plasma, and more particularly, to a power supply unit which supplies a radio frequency (RF) power to a plurality of points of a plasma electrode and a plasma apparatus including the power supply unit. [0004] 2. Description of the Related Art [0005] Flat panel display (FPD) devices having portability and low power consumption have been a subject of increasing research in the present information age. Among the various types of FPD devices, liquid crystal display (LCD) devices are commonly used in notebook and desktop computers because of their high resolution, capability of displaying colored images, and high quality image di...

Claims

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Application Information

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IPC IPC(8): C23F1/00H01J17/49H01J37/32H05H1/46
CPCH01J37/32174H01J37/32082
Inventor LEE, JEONG-BEOM
Owner JUSUNG ENG