Impact-resistant fast reflecting mirror and manufacturing method thereof

Abstract

The invention discloses an anti-impact fast reflecting mirror and a manufacturing method thereof, and relates to the technical field of fast reflecting mirrors, the anti-impact fast reflecting mirror comprises a mirror surface structure and a substrate, the mirror surface structure is located above the substrate, the mirror surface structure is further provided with an upper driving electrode structure and a reflecting layer, the substrate is provided with a lower driving electrode structure, and the lower driving electrode structure is located above the reflecting layer. A gap exists between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is arranged between the lower driving electrode structure and the mirror surface structure. According to the impact-resistant fast reflecting mirror and the manufacturing method thereof, the impact resistance can be improved, and it is ensured that the fast reflecting mirror can still work efficiently in various severe environments.

Description

Technical Field

[0001] The invention relates to the technical field of fast-reflection mirrors, and in particular to an impact-resistant fast-reflection mirror and a manufacturing method thereof. Background Art

[0002] With the development of space exploration and satellite communication technology, space optical communication (Space Optical Communication) as a high data transmission rate, low latency communication method, has received more and more attention. Compared with traditional radio frequency communication, optical communication has higher bandwidth and longer transmission distance, which can effectively support future communication needs. In space optical communication systems, fast steering mirrors (Fast Steering Mirror, FSM) are a key component responsible for quickly and accurately adjusting the direction of the light beam to ensure stable transmission of the light beam.

[0003] The performance of the fast reflex mirror directly affects the stability and effectiveness of the communication system. However, in the space environment, the fast reflex mirror is often exposed to various shocks and vibrations, such as vibrations during launch and changes in the microgravity environment during satellite operation. These factors may affect the performance of the fast reflex mirror and cause unstable signal transmission. Summary of the invention

[0004] The purpose of the present invention is to provide an impact-resistant fast-reflecting mirror and a manufacturing method thereof, so as to solve the problems existing in the above-mentioned prior art and improve the impact resistance to ensure that it can still work efficiently in various harsh environments.

[0005] To achieve the above object, the present invention provides the following solutions:

[0006] The present invention provides an impact-resistant fast-reflecting mirror, comprising: a mirror structure and a substrate, wherein the mirror structure is located above the substrate, an upper driving electrode structure and a reflective layer are further arranged on the mirror structure, a lower driving electrode structure is arranged on the substrate, a gap exists between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is arranged between the lower driving electrode structure and the mirror structure.

[0007] Preferably, the mirror structure also includes a mirror body, a universal joint frame and an outer frame, the mirror body, the universal joint frame and the outer frame are arranged in sequence from the inside to the outside, the mirror body is provided with the reflective layer, the mirror body and the universal joint frame are connected by two symmetrically arranged first spring beams, the universal joint frame and the outer frame are connected by two symmetrically arranged second spring beams, and the symmetry axes of the two first spring beams and the symmetry axes of the two second spring beams are vertically arranged.

[0008] Preferably, the upper driving electrode structure is disposed on the outer frame, and the upper driving electrode structure is used for grounding.

[0009] Preferably, a first buffer fin is also provided at the edge of the mirror body, and the position of the first buffer fin corresponds to the position of the second spring beam, the first buffer fin is located between the mirror body and the universal joint frame, the first buffer fin is connected to the mirror body, and there is a gap between the first buffer fin and the universal joint frame; a second buffer fin is also provided at the edge of the universal joint frame, and the position of the second buffer fin corresponds to the position of the first spring beam, the second buffer fin is located between the universal joint frame and the outer frame, the second buffer fin is connected to the universal joint frame, and there is a gap between the second buffer fin and the outer frame.

[0010] Preferably, the size of the connecting end of the first buffer tail wing is smaller than the size of the free end of the first buffer tail wing, and the size of the connecting end of the second buffer tail wing is smaller than the size of the free end of the second buffer tail wing.

[0011] Preferably, the buffer structure comprises a first tail wing buffer layer and a second tail wing buffer layer, the first tail wing buffer layer corresponds to the position of the first buffer tail wing, and the second tail wing buffer layer corresponds to the position of the second buffer tail wing.

[0012] Preferably, the lower driving electrode structure comprises two symmetrically arranged inner-axis driving electrodes and two symmetrically arranged outer-axis driving electrodes, and the two inner-axis driving electrodes are located on the inner sides of the two outer-axis driving electrodes.

[0013] Preferably, the symmetry axes of the two inner-axis driving electrodes and the symmetry axes of the two second spring beams are located in the same vertical plane, and the symmetry axes of the two outer-axis driving electrodes and the symmetry axes of the two first spring beams are located in the same vertical plane.

[0014] Preferably, the buffer structure comprises a central buffer layer, an inner axis buffer layer and an outer axis buffer layer, the central buffer layer is located at the center of the lower driving electrode structure, the inner axis buffer layer is located on the inner axis driving electrode, and the outer axis buffer layer is located on the outer axis driving electrode.

[0015] The present invention also provides a method for manufacturing the impact-resistant fast-reflection mirror, comprising the following steps:

[0016] Step 1, preparing a base and a substrate of a mirror structure;

[0017] Step 2: sputtering metal on the front side of the mirror structure substrate and patterning to form an upper driving electrode structure and a reflective layer; sputtering metal on the front side of the substrate and patterning to form a lower driving electrode structure;

[0018] Step 3: etching the back side of the substrate of the mirror structure to form a cavity and a lead groove; patterning the front side of the lower driving electrode structure and the front side of the substrate to form a buffer structure;

[0019] Step 4, the base body and the substrate of the mirror structure are bonded together by anodic bonding;

[0020] Step 5: etching the front side of the substrate of the bonded mirror structure to form the remaining structures of the mirror structure.

[0021] Compared with the prior art, the present invention has achieved the following technical effects:

[0022] The present invention provides a buffer structure between the mirror structure and the lower driving electrode structure, which can effectively absorb the impact force after the mirror structure contacts the mirror structure, improve the impact resistance of the device, and buffer the vertical piston and torsional impact forces. The present invention buffers the impact of the mirror structure through the buffer structure, protects the mirror structure from damage, increases the reliability of the fast mirror and prolongs its service life. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0024] Figure 1 This is an axonometric diagram of the impact-resistant quick-reflection mirror of the present invention (without the first buffer tail wing and the second buffer tail wing);

[0025] Figure 2 It is an axonometric view of the mirror structure of the present invention;

[0026] Figure 3 It is a top view of the mirror structure of the present invention (with a first buffer tail wing and a second buffer tail wing);

[0027] Figure 4 Schematic diagram of the first spring beam and the second spring beam of the present invention Figure 1 ;

[0028] Figure 5 Schematic diagram of the first spring beam and the second spring beam of the present invention Figure 2 ;

[0029] Figure 6 Schematic diagram of the first spring beam and the second spring beam of the present invention Figure 3 ;

[0030] Figure 7 Schematic diagram of the first spring beam and the second spring beam of the present invention Figure 4 ;

[0031] Figure 8 The first buffer tail wing and the second buffer tail wing of the present invention are schematically shown in FIG. Figure 1 ;

[0032] Fig. 9 The first buffer tail wing and the second buffer tail wing of the present invention are schematically shown in FIG. Figure 2 ;

[0033] Fig.10 The first buffer tail wing and the second buffer tail wing of the present invention are schematically shown in FIG. Figure 3 ;

[0034] Fig.11 The first buffer tail wing and the second buffer tail wing of the present invention are schematically shown in FIG. Figure 4 ;

[0035] Fig.12 A top view of the lower driving electrode structure of the present invention;

[0036] Fig.13 A top view of the lower driving electrode structure with a buffer structure of the present invention Figure 1 ;

[0037] Fig.14 A top view of the lower driving electrode structure with a buffer structure of the present invention Figure 2 ;

[0038] Fig.15 It is a schematic cross-sectional view of the impact-resistant fast-reflecting mirror of the present invention (without the first spring beam, the second spring beam, the first buffer tail wing and the second buffer tail wing);

[0039] Fig.16 This is a schematic diagram of step 1 of the method for manufacturing an impact-resistant fast-reflecting mirror of the present invention;

[0040] Fig.17 This is a schematic diagram of step 2 of the method for manufacturing an impact-resistant fast-reflection mirror of the present invention;

[0041] Fig.18 This is a schematic diagram of step 3 of the method for manufacturing an impact-resistant fast-reflection mirror of the present invention;

[0042] Fig.19 This is a schematic diagram of step 4 of the method for manufacturing an impact-resistant fast-reflection mirror of the present invention;

[0043] Fig. 20 This is a schematic diagram of step 5 of the method for manufacturing an impact-resistant fast-reflection mirror of the present invention;

[0044] In the figure: 1-substrate, 2-upper driving electrode structure, 3-reflective layer, 4-mirror body, 5-universal joint frame, 6-outer frame, 7-first spring beam, 8-second spring beam, 9-first buffer tail wing, 10-second buffer tail wing, 11-first tail wing buffer layer, 12-second tail wing buffer layer, 13-inner axis driving electrode, 14-outer axis driving electrode, 15-pin, 16-center buffer layer, 17-inner axis buffer layer, 18-outer axis buffer layer, 19-base of mirror structure, 20-cavity, 21-lead groove. DETAILED DESCRIPTION

[0045] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0046] The purpose of the present invention is to provide an impact-resistant fast-reflecting mirror and a manufacturing method thereof, so as to solve the problems existing in the above-mentioned prior art and improve the impact resistance to ensure that it can still work efficiently in various harsh environments.

[0047] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0048] Embodiment 1

[0049] like Figures 1 to 15 As shown, this embodiment provides an impact-resistant fast reflection mirror, including: a mirror structure and a substrate 1, the mirror structure is located above the substrate 1, an upper driving electrode structure 2 and a reflective layer 3 are also arranged on the mirror structure, the substrate 1 is made of glass, a lower driving electrode structure is arranged on the substrate 1, the upper driving electrode structure 2 and the lower driving electrode structure are respectively connected to the pin 15, there is a gap between the upper driving electrode structure 2 and the lower driving electrode structure, and a buffer structure is arranged between the lower driving electrode structure and the mirror structure, the buffer structure is used to buffer the impact of the mirror structure, protect the mirror structure from damage, increase the reliability of the fast reflection mirror and extend its service life.

[0050] In this embodiment, the mirror structure also includes a mirror body 4, a gimbal frame 5 and an outer frame 6. The mirror body 4, the gimbal frame 5 and the outer frame 6 are all made of silicon wafers, preferably low-resistance silicon wafers. The mirror body 4, the gimbal frame 5 and the outer frame 6 are arranged in sequence from the inside to the outside. The upper driving electrode structure 2 is arranged on the outer frame 6, and the upper driving electrode structure 2 is used for grounding. The mirror body 4 determines the optical aperture of the fast reflection mirror. A reflective layer 3 is arranged on the mirror body 4. The gimbal frame 5 is used to realize two-axis scanning. The mirror body 4 and the gimbal frame 5 are connected by two symmetrically arranged first spring beams 7 to realize the torsion between the mirror body 4 and the gimbal frame 5. The outer frame 6 is used to support and protect the mirror body 4 and the gimbal frame 5. The gimbal frame 5 and the outer frame 6 are connected by two symmetrically arranged second spring beams 8 to realize the torsion between the gimbal frame 5 and the outer frame 6. The symmetry axes of the two first spring beams 7 and the symmetry axes of the two second spring beams 8 are vertically arranged.

[0051] In this embodiment, a cavity 20 for the movement of the mirror body 4 and the universal joint frame 5 and a lead groove 21 for the lead of the lower driving electrode structure to pass through are opened at the bottom of the outer frame 6. The mirror body 4 and the universal joint frame 5 are supported by the outer frame 6, and the outer frame 6 determines the driving gap between the upper driving electrode structure 2 and the lower driving electrode structure.

[0052] In this embodiment, a first buffer fin 9 is further provided on the edge of the mirror body 4, and the position of the first buffer fin 9 corresponds to the position of the second spring beam 8. The first buffer fin 9 is located between the mirror body 4 and the universal joint frame 5, and the first buffer fin 9 is connected to the mirror body 4. There is a gap between the first buffer fin 9 and the universal joint frame 5, and the size of the connecting end of the first buffer fin 9 is smaller than the size of the free end of the first buffer fin 9, which effectively increases the contact area of ​​the first buffer fin 9; a second buffer fin 10 is further provided on the edge of the universal joint frame 5, and the position of the second buffer fin 10 corresponds to the position of the first spring beam 7. The second buffer fin 10 is located between the universal joint frame 5 and the outer frame 6, and the second buffer fin 10 is connected to the universal joint frame 5. There is a gap between the second buffer fin 10 and the outer frame 6, and the size of the connecting end of the second buffer fin 10 is smaller than the size of the free end of the second buffer fin 10, which effectively increases the contact area of ​​the second buffer fin 10. Under a large torsional impact, the first buffer tail wing 9 and the second buffer tail wing 10 contact the substrate 1 first, avoiding the contact between the mirror body 4 and the universal joint frame 5 and the substrate 1, thereby protecting the mirror body 4 and the universal joint frame 5 from damage.

[0053] In this embodiment, the first buffer tail wing 9 and the second buffer tail wing 10 adopt a fishtail structure; the size of the connecting end of the first buffer tail wing 9 is smaller than the size of the free end of the first buffer tail wing 9, and the size of the connecting end of the first buffer tail wing 9 and the size of the free end of the first buffer tail wing 9 are both larger than the size of the middle part of the first buffer tail wing 9; the size of the connecting end of the second buffer tail wing 10 is smaller than the size of the free end of the second buffer tail wing 10, and the size of the connecting end of the second buffer tail wing 10 and the size of the free end of the second buffer tail wing 10 are both larger than the size of the middle part of the second buffer tail wing 10, which can effectively reduce the concentrated stress after contact and further improve the impact resistance.

[0054] In this embodiment, the buffer structure includes a first tail wing buffer layer 11 and a second tail wing buffer layer 12 . The first tail wing buffer layer 11 corresponds to the first buffer tail wing 9 , and the second tail wing buffer layer 12 corresponds to the second buffer tail wing 10 .

[0055] In this embodiment, the lower driving electrode structure includes two symmetrically arranged inner axis driving electrodes 13 and two symmetrically arranged outer axis driving electrodes 14, the two inner axis driving electrodes 13 are located inside the two outer axis driving electrodes 14; the symmetry axes of the two inner axis driving electrodes 13 and the symmetry axes of the two second spring beams 8 are located in the same vertical plane, and the symmetry axes of the two outer axis driving electrodes 14 and the symmetry axes of the two first spring beams 7 are located in the same vertical plane. After the driving signal is applied to the lower driving electrode structure, the mirror body 4 and the universal joint frame 5 are twisted.

[0056] In this embodiment, the buffer structure includes a central buffer layer 16, an inner axis buffer layer 17 and an outer axis buffer layer 18; the central buffer layer 16 is located at the center of the lower driving electrode structure, and is used to buffer the vertical piston impact; the inner axis buffer layer 17 is located on the inner axis driving electrode 13, and is used to buffer the impact of the mirror body 4, including torsional impact and vertical piston impact; the outer axis buffer layer 18 is located on the outer axis driving electrode 14, and is used to buffer the impact of the universal joint frame 5, including torsional impact and vertical piston impact.

[0057] In this embodiment, the buffer structure is made of flexible or low Young's modulus materials such as polyimide (PI), which can effectively absorb the impact force after the mirror structure contacts it, and improve the impact resistance of the device. The buffer structure adopts a distributed design, which can buffer vertical piston and torsional impact forces, and can reduce the impact on the driving force between the upper driving electrode structure 2 and the lower driving electrode structure compared to the full coverage design.

[0058] Embodiment 2

[0059] like Figures 16 to 20 As shown, this embodiment provides a method for manufacturing the impact-resistant fast reflection mirror of Embodiment 1, comprising the following steps:

[0060] Step 1, preparing a base 19 (silicon wafer) and a substrate 1 of a mirror structure;

[0061] Step 2: sputtering metal on the front side of the mirror structure substrate 19 and patterning to form the upper driving electrode structure 2 and the reflective layer 3; sputtering metal on the front side of the substrate 1 and patterning to form the lower driving electrode structure;

[0062] Step 3: The back of the mirror structure substrate 19 is etched to form a cavity 20 and a lead groove 21; the front of the lower driving electrode structure and the front of the substrate 1 are patterned to form a buffer structure;

[0063] Step 4: the base 19 of the mirror structure and the substrate 1 are bonded together by anodic bonding;

[0064] Step five, the mirror body 4, the universal joint frame 5, the first spring beam 7, the second spring beam 8, the first buffer tail wing 9 and the second buffer tail wing 10 of the mirror structure are etched on the front side of the bonded mirror structure.

[0065] The present invention uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only used to help understand the method and core ideas of the present invention. At the same time, for those skilled in the art, according to the ideas of the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. An impact-resistant fast-reflecting mirror, characterized in that: include: A mirror structure and a substrate, wherein the mirror structure is located above the substrate, an upper driving electrode structure and a reflective layer are also arranged on the mirror structure, a lower driving electrode structure is arranged on the substrate, there is a gap between the upper driving electrode structure and the lower driving electrode structure, and a buffer structure is arranged between the lower driving electrode structure and the mirror structure.

2. The impact-resistant fast-reflecting mirror according to claim 1, characterized in that: The mirror structure also includes a mirror body, a universal joint frame and an outer frame. The mirror body, the universal joint frame and the outer frame are arranged in sequence from the inside to the outside. The mirror body is provided with the reflecting layer. The mirror body and the universal joint frame are connected by two symmetrically arranged first spring beams, and the universal joint frame and the outer frame are connected by two symmetrically arranged second spring beams. The symmetry axes of the two first spring beams and the symmetry axes of the two second spring beams are vertically arranged.

3. The impact-resistant fast-reflecting mirror according to claim 2, characterized in that: The upper driving electrode structure is disposed on the outer frame, and the upper driving electrode structure is used for grounding.

4. The impact-resistant fast-reflecting mirror according to claim 2, characterized in that: A first buffer fin is also provided on the edge of the mirror body, and the position of the first buffer fin corresponds to the position of the second spring beam. The first buffer fin is located between the mirror body and the universal joint frame, and the first buffer fin is connected to the mirror body, and there is a gap between the first buffer fin and the universal joint frame; a second buffer fin is also provided on the edge of the universal joint frame, and the position of the second buffer fin corresponds to the position of the first spring beam. The second buffer fin is located between the universal joint frame and the outer frame, and the second buffer fin is connected to the universal joint frame, and there is a gap between the second buffer fin and the outer frame.

5. The impact-resistant fast-reflecting mirror according to claim 4, characterized in that: The size of the connecting end of the first buffer tail wing is smaller than the size of the free end of the first buffer tail wing, and the size of the connecting end of the second buffer tail wing is smaller than the size of the free end of the second buffer tail wing.

6. The impact-resistant fast-reflecting mirror according to claim 4, characterized in that: The buffer structure includes a first tail wing buffer layer and a second tail wing buffer layer, the first tail wing buffer layer corresponds to the position of the first buffer tail wing, and the second tail wing buffer layer corresponds to the position of the second buffer tail wing.

7. The impact-resistant fast-reflecting mirror according to claim 2, characterized in that: The lower driving electrode structure includes two symmetrically arranged inner-axis driving electrodes and two symmetrically arranged outer-axis driving electrodes, and the two inner-axis driving electrodes are located on the inner sides of the two outer-axis driving electrodes.

8. The impact-resistant fast-reflecting mirror according to claim 7, characterized in that: The symmetry axes of the two inner-axis driving electrodes and the symmetry axes of the two second spring beams are located in the same vertical plane, and the symmetry axes of the two outer-axis driving electrodes and the symmetry axes of the two first spring beams are located in the same vertical plane.

9. The impact-resistant fast-reflecting mirror according to claim 7, characterized in that: The buffer structure includes a central buffer layer, an inner axis buffer layer and an outer axis buffer layer, wherein the central buffer layer is located at the center of the lower driving electrode structure, the inner axis buffer layer is located on the inner axis driving electrode, and the outer axis buffer layer is located on the outer axis driving electrode.

10. A method for manufacturing the impact-resistant fast-reflecting mirror according to any one of claims 1 to 9, characterized in that: The following steps are involved: Step 1, preparing a base and a substrate of a mirror structure; Step 2: sputtering metal on the front side of the mirror structure substrate and patterning to form an upper driving electrode structure and a reflective layer; sputtering metal on the front side of the substrate and patterning to form a lower driving electrode structure; Step 3, etching the back side of the substrate of the mirror structure to form a cavity and a lead groove; The front side of the lower driving electrode structure and the front side of the substrate are patterned to form a buffer structure; Step 4, the base body and the substrate of the mirror structure are bonded together by anodic bonding; Step 5: etching the front side of the substrate of the bonded mirror structure to form the remaining structures of the mirror structure.

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