Precise positioning platform with six freedom of motion
A technology of precise positioning and degrees of freedom, applied in the parts, instruments, casings and other directions of the instrument, can solve the problems of difficult to guarantee assembly accuracy, complex structure, limited adjustment stroke, etc., to improve assembly accuracy, simple structure, and reduce manufacturing. effect of difficulty
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2010-12-29
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a positioning platform, and in particular to a six-degree-of-freedom precision positioning platform composed of a piezoelectric driver and a rotating joint flexible hinge. Background technique
[0002] Various types of precision positioning stages are used in the fields of semiconductor device manufacturing, precision machining, biomedical processing, and optical and image alignment. For example, the wafer positioning platform used in the lithography machine, the reticle positioning platform, etc. In these fields, most precision positioning platforms need to have technical characteristics such as multiple degrees of freedom and high precision, and the installation space is very limited, especially in the height direction.
[0003] Patent CN1534689A discloses a fine-tuning stage. The tilting stage realizes fine-tuning and positioning of the three degrees of freedom Z-θx-θy through three wedge-shaped segments evenly distributed...
Examples
Embodiment Construction
[0024] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.
[0025] figure 1 Shown is the front view of the six-degree-of-freedom precision positioning platform of a preferred embodiment of the present invention; Fig. 2 shows figure 1 The rotated sectional view along A-A in the center. Please refer to figure 1 and Figure 2.
[0026] The six-degree-of-freedom precision positioning platform disclosed in this embodiment is used to carry the reticle 406 printed with patterns for exposure, so as to position the pattern to be exposed to a designated position.
[0027] The overall structure of the six-degree-of-freedom precision positioning platform is divided into a suction plate 103 , a horizontal adjustment platform, a vertical adjustment platform and a base 101 from top to bottom.
[0028] The suction table 103 is used to vacuum absorb the reticle 406 to re...