The interconnection structure and production method of high -depth and width ratio
A technology of interconnection structure and fabrication method, applied in semiconductor/solid-state device manufacturing, electrical components, electric-solid-state devices, etc., can solve the problems of inability to effectively adapt to the three-dimensional packaging interconnection structure, difficult aspect ratio of the interconnection structure, etc. The effect of reducing processing costs, simple process steps, and simple and compact structure
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0059] The present invention will be further described below in conjunction with specific drawings and embodiments.
[0060] Such as figure 1 and Figure 16 Shown: in order to obtain a higher aspect ratio and improve the adaptability of the interconnection structure, the present invention includes a substrate 1, the substrate 1 has a first main surface and a second main surface corresponding to the first main surface ; The substrate 1 is provided with a number of through holes; a first barrier layer 8 is deposited on the first main surface of the substrate 1, and a second barrier layer is deposited on the second main surface of the substrate 1 18: The first barrier layer 8 covers the first main surface of the substrate 1 and covers the sidewall of the upper part of the through hole, and the second barrier layer 18 covers the second main surface of the substrate 1 and covers the lower part of the through hole sidewall, the first barrier layer 8 is in contact with the second b...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 