Double exposure implementation method for inhomogeneous illumination image
Patent Information
- Authority / Receiving Office
- CN Β· China
- Current Assignee / Owner
- AIR FORCE UNIV PLA
- Publication Date
- 2014-01-22
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of secondary exposure of images, and in particular relates to a method for realizing secondary exposure of images with non-uniform illumination. Background technique
[0002] At present, wide dynamic technology mainly uses special DSP (digital signal processing) circuits to expose the bright part with the most suitable shutter speed, and then expose the dark part with the most suitable shutter speed, and then recombine the two images through DSP processing , so that the bright part and the dark part can be seen clearly, which requires high technology to minimize the loss of color and clarity. However, due to the limitation of the characteristics of CCD, the wide dynamic range of the camera can reach 60dB at most, so even if the most advanced Advanced wide dynamic technology cameras will still obtain non-uniform illumination images under complex lighting conditions, resulting in the problem that the obtained ...