Interferometric measurement system imaging distortion calibration device

A calibration device and distortion calibration technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of damage, unsuitable in-situ imaging distortion calibration, etc., and achieve the effect of reducing complexity, compact structure and weight

Inactive Publication Date: 2016-06-01
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Application Information

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Problems solved by technology

However, this method needs to process or deposit grid-type marking points on the surface of the tested optical component, which may damage the surface of the tested optical component, so it is not suitable for in-situ imaging distortion calibration of the high-precision tested optical component

Method used

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  • Interferometric measurement system imaging distortion calibration device
  • Interferometric measurement system imaging distortion calibration device
  • Interferometric measurement system imaging distortion calibration device

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Embodiment Construction

[0018] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0019] Such as Figure 1~Figure 4 As shown, a kind of interferometric system imaging distortion calibration device, which is a spherical crown, on the calibration device along the horizontal and vertical distribution with a number of through holes 11, the center of each through hole 11 and each adjacent The center distances of the through holes 11 are the same, the center line of each through hole 11 passes through the center of the sphere where the calibration device is located, and one of the through holes 11 is located at the center of the calibration device, which is the central through hole 13 .

[0020] The through hole 11 is an inverted tapered hole.

[0021] The lower surface 12 of the calibration device has the same shape as the upper surface of the tested optical element 2 .

[0022] The specific working process of this e...

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Abstract

The invention discloses an interferometric measurement system imaging distortion calibration device, which belongs to the technical field of optical element surface interferometric measurement. On the premise that optical design parameters of the interferometric measurement system are unknown, high-precision noncontact non-destructive in-situ detection on the tested optical element is realized, the imaging distortion of the interferometric measurement system is obtained, the structure is compact, the weight is reduced, the space is saved, error accumulation is reduced, and the operation complexity is reduced. The calibration device is in a spherical crown shape, a plurality of through holes are horizontally and vertically distributed in the calibration device, the distance between the center of each through hole and the center of a through hole adjacent to the through hole is the same, the central line of each through hole passes through the spherical center of a spherical surface where the calibration device is, one through hole is located in the center of the calibration device, and the through hole is the central through hole.

Description

technical field [0001] The invention belongs to the technical field of surface shape interference measurement of optical elements, and relates to an imaging distortion calibration device of an interference measurement system. Background technique [0002] The interferometer is currently the most commonly used instrument in the surface shape detection technology of optical components. The interferometer can be used with different etalons to detect the surface shape errors of optical components with different numerical apertures. Calibrate the error of the interferometric system composed of interferometer and etalon. The imaging distortion of the interferometric system is an important source of error. The surface error detection results containing imaging distortion will introduce coordinates in the process of guiding the surface shape of optical components. Mapping errors, thereby reducing the surface processing accuracy of optical components. [0003] In the prior art, ther...

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Application Information

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IPC IPC(8): G01B9/02
CPCG01B9/02072
Inventor张文龙苗亮刘钰王辉周烽郭本银马冬梅金春水
OwnerCHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI