Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod

a processing apparatus and radio frequency feeder technology, applied in electrical devices, lighting and heating apparatus, electrical discharge tubes, etc., can solve the problems of large, expensive and difficult processing of insulating components, manufacturing or replacement of insulating components b>24/b>, etc., and achieve the effect of large, expensive and difficult to process

Inactive Publication Date: 2007-12-13
HAYASHI DAISUKE +4
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0008] This invention is developed by focusing the aforementioned problems of the conventional plasma processing apparatus and the conventional electrode unit. An object of the present invention is to provide an electrode unit that can sufficiently restrain loss of a radio frequency power at low cost, and to provide a plasma processing apparatus including the electrode unit.
[0026] In addition, an object of the present invention is to provide a radio frequency feeder rod that can prevent a heated state thereof by enhancing cooling efficiency thereof.

Problems solved by technology

However, the quartz or the ceramics for forming the insulating member 24 is generally large, expensive and difficult to process.
Thus, manufacture or replacement of the insulating member 24 has a cost problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
  • Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
  • Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] Hereinafter, preferred embodiments of a plasma processing apparatus according to the present invention will be described in detail with reference to the attached drawings. In the specification and the drawings, elements that have substantially the same structure and function are represented by the same numeral sign, and overlapped explanation is omitted.

[0039]FIG. 1 is a schematic sectional view of a plasma etching apparatus 100 of the embodiment. FIG. 2 is a partial sectional view of the plasma etching apparatus 100. As shown in FIG. 1, the plasma etching apparatus 100 includes an airtight processing container 102, which is for example substantially cylindrical and grounded. At a lower portion in the processing container 102, a lower electrode unit 104 as an example of an electrode unit is provided. The lower electrode unit 104 also serves as a table on which a semiconductor wafer W is placed.

[0040] Between the semiconductor wafer W and the lower electrode unit 104, a heat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion communicates with atmospheric air outside the processing container.

Description

FIELD OF THE INVENTION [0001] The present invention relates to a plasma processing apparatus wherein a radio frequency power is applied to an electrode in a processing container to conduct a plasma process, and to an electrode unit. DESCRIPTION OF THE RELATED ART [0002] In a plasma process conducted in a manufacturing process of a semiconductor device or a manufacturing process of a liquid crystal display, a process gas is introduced into an airtight processing container in which an electrode is provided, a radio frequency power is applied to the electrode, and the process gas is made into plasma. By means of the plasma, a predetermined process such as an etching process or a film-forming process is conducted to a surface of an object to be processed. [0003] In the plasma processing apparatus that carries out the process, for example at a lower portion of the processing container, an electrode unit is arranged, which also serves as a table for the object to be processed. At an upper...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & AuthorityApplications(United States)
IPC IPC(8): F28F7/00H01J37/32
CPCH01J37/32009H01J37/32532H01J37/32082
InventorHAYASHI, DAISUKENAGASEKI, KAZUYAHIMORI, SHINJIMATSUURA, ATSUSHINONAKA, RYO
OwnerHAYASHI DAISUKE