Chromium target production method

A manufacturing method and technology for chromium targets, which are applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of high manufacturing cost of chromium targets, high requirements for manufacturing equipment, harsh process conditions, etc. The effect of saving process cost, improving uniformity and increasing density

CN104439246AActive Publication Date: 2015-03-25KONFOONG MATERIALS INTERNATIONAL CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2015-03-25

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Abstract

The invention discloses a chromium target production method. The method comprises the following steps: a hot-pressed sintering process is adopted to perform the compactness treatment for chromium powder to form a chromium target blank under the conditions of a preset temperature of 1100-1300 DEG C and a preset pressure higher than 30 MPa; and the chromium target blank is cooled to form a chromium target. The chromium target production method can form the chromium target with the compactness up to 99.5%, the average grain size smaller than 50 microns and the uniform structure. Compared with a hot isostatic pressure process, the process equipment requirements and the process conditions of the chromium target production process are reduced, and the process cost is saved.
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Description

technical field

[0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for manufacturing a chromium target. Background technique

[0002] Chromium is a silver-white metal, which has good corrosion resistance to acids and alkalis, and has a strong passivation ability in the atmosphere, does not easily react with air, and can maintain luster for a long time, and chromium also has a high hardness and resistivity.

[0003] Based on the above advantages, chromium has been widely used in surface engineering of mechanical functional thin films, microelectronic thin films, electromagnetic functional thin films, and optical thin films. Among them, in the application of microelectronic thin films and electromagnetic functional thin films, the sputtering coating process is mostly used to form chromium thin films. In the sputtering coating process, the quality of the chromium target used has an important influence on the formed chromium fil...

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Embodiment Construction

[0029] As mentioned in the background art, the existing manufacturing methods of chromium targets have high requirements on process equipment and harsh manufacturing process conditions, resulting in high manufacturing costs and low yields of chromium targets. For this reason, the present invention provides a new method for manufacturing a chromium target. The method for manufacturing a chromium target adopts a hot pressing sintering process, and cooperates with specific temperature, pressure control and other process settings to obtain a density greater than 99.5 %, the grain size is less than 50μm, and the high-quality chromium target with uniform internal structure meets the requirements of the sputtering coating process for the chromium target. In addition, compared with the existing chromium target manufacturing process, the chromium target manufacturing method provided by the present invention requires less process equipment, and the process conditions are easy to control,...