Display substrate and display device

Abstract

The invention provides a display substrate and a display device. The display substrate comprises a substrate layer, wherein the substrate layer comprises a line concentration area; the line concentration area is arranged on one side of the substrate layer and comprises a plurality of first driving electrodes which are arranged at intervals in the first direction, each first driving electrode comprises a first electrode layer and a second electrode layer which are sequentially arranged in the second direction, and the second direction is perpendicular to the first direction; wherein the projection of the first electrode layer in the first direction covers the projection of the second electrode layer in the first direction. According to the technical scheme, the sealing performance of the display substrate can be improved, and then the reliability and performance of the display device are improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and more specifically, to a display substrate and a display device. Background Art

[0002] As an emerging optical device, liquid crystal lenses have been widely used in various fields, including vision correction, wearable devices for augmented reality (AR) and virtual reality (VR). It uses the property of liquid crystal materials to change the refractive index under the action of an electric field to achieve the focusing and dispersion of light. Compared with traditional lenses, liquid crystal lenses have the advantages of small size, light weight, fast response, low power consumption, and adjustable focal length. Therefore, they have attracted more and more attention.

[0003] In the existing liquid crystal lens design, the insulating layer is located between different film layers to prevent short circuits. However, due to the structural characteristics of the existing liquid crystal lens substrate, the insulating layer has poor coverage of the film layers in the substrate, resulting in short circuits in the liquid crystal lens and reduced reliability of the liquid crystal lens. Therefore, how to improve the coverage of the insulating layer on the liquid crystal lens is a technical problem that needs to be solved urgently. Summary of the invention

[0004] In view of the above problems, the present application provides a display substrate and a display device, which can improve the sealing performance of the display substrate and further improve the reliability and performance of the display device.

[0005] In a first aspect, a display substrate is provided, comprising: a substrate layer, the substrate layer comprising a collection line area; arranged on one side of the substrate layer, the collection line area comprising a plurality of first driving electrodes arranged at intervals along a first direction, the first driving electrodes comprising a first electrode layer and a second electrode layer arranged in sequence along a second direction, the second direction being perpendicular to the first direction; wherein a projection of the first electrode layer in the first direction covers a projection of the second electrode layer in the first direction.

[0006] In combination with the first aspect, in certain embodiments of the first aspect, the first electrode layer includes a first transparent electrode layer, and the second electrode layer includes a first metal electrode layer; or the first electrode layer includes the first metal electrode layer, and the second electrode layer includes the first transparent electrode layer.

[0007] In combination with the first aspect, in certain implementations of the first aspect, the substrate layer further includes a signal introduction region, and the signal introduction region and the collector region are sequentially arranged on one side of the substrate layer along the first direction; the signal introduction region includes a first transparent electrode layer.

[0008] In combination with the first aspect, in certain implementations of the first aspect, the substrate layer also includes a signal introduction area, the signal introduction area and the collection area are arranged in sequence along the first direction, the signal introduction area includes a first introduction area and a second introduction area arranged along the first direction, the first introduction area is located between the collection area and the second introduction area; the first introduction area includes the first transparent electrode layer, and the second introduction area includes the first driving electrode.

[0009] In combination with the first aspect, in certain implementations of the first aspect, the display substrate further includes an insulating layer; the insulating layer is disposed on a side of the collection area and the signal introduction area away from the substrate layer; the material of the insulating layer includes at least one of Si3N4 and SiO2; in the second direction, the size of the insulating layer is 100nm-300nm.

[0010] In combination with the first aspect, in certain implementations of the first aspect, the display substrate further includes a second driving electrode layer, the insulating layer is located between the substrate layer and the second driving electrode layer; the material of the second driving electrode layer includes indium tin oxide; in the second direction, the size of the second driving electrode layer is 20nm-60nm; in the third direction, the size of the second driving electrode layer is 2μm-4μm, and the third direction is perpendicular to the first direction and the second direction.

[0011] In combination with the first aspect, in certain implementations of the first aspect, a first via and a second via are provided on the insulating layer, the first via is provided on the insulating layer corresponding to the collection area in the first direction, and the second via is provided on the insulating layer corresponding to the signal introduction area in the first direction.

[0012] In combination with the first aspect, in some implementations of the first aspect, the hole density of the first via hole and the hole density of the second via hole are 0.0004 / μm -2 .

[0013] In combination with the first aspect, in certain implementations of the first aspect, the material of the first transparent electrode layer includes at least one of indium tin oxide, indium zinc oxide, and zinc aluminum oxide; the material of the first metal electrode layer includes at least one of Al, Mo, Cu, Au, Ti, Ni, and Ag.

[0014] In combination with the first aspect, in some implementations of the first aspect, in the second direction, a size of the first transparent electrode layer is 40 nm-80 nm, and a size of the first metal electrode layer is 100 nm-200 nm.

[0015] In combination with the first aspect, in some implementations of the first aspect, the display substrate further includes an organic resin film, and the second driving electrode layer is located between the organic resin film and the insulating layer; in the second direction, a size of the organic resin film is 2 μm-5 μm.

[0016] In a second aspect, a display device is provided, comprising: a display substrate as described in any embodiment of the first aspect. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on the drawings without paying creative work.

[0018] Figure 1 A schematic diagram of the wiring of a liquid crystal lens of a related technology of the present application;

[0019] Figure 2 A cross-sectional view of a driving electrode in a collection area of ​​a related art of the present application;

[0020] Figure 3 A schematic structural diagram of a display substrate according to an embodiment of the present application;

[0021] Figure 4 This is a schematic structural diagram of a display substrate according to another embodiment of the present application;

[0022] Figure 5 This is a schematic structural diagram of a display substrate according to another embodiment of the present application;

[0023] Figure 6 A front view of a display substrate according to an embodiment of the present application;

[0024] Figure 7 It is a schematic structural diagram of a second via hole according to an embodiment of the present application. Description of the drawings:

[0026] Display substrate-200;

[0027] Collection area-11 / 12 / 30, signal introduction area-13 / 40, ITO driving electrode-14, driving electrode-15 in collection area;

[0028] Substrate layer-20, first driving electrode-31, first electrode layer-311, second electrode layer-312, first introduction region-410, second introduction region-420, insulating layer-50, second driving electrode layer-60, first via hole-510, second via hole 520, second metal electrode layer 80;

[0029] The first direction is X, the second direction is Y, and the third direction is Z. DETAILED DESCRIPTION

[0030] In order to make the objectives, technical solutions and advantages of the present application clearer, the implementation methods of the present application will be further described in detail below in conjunction with the accompanying drawings.

[0031] The "range" disclosed in the present application is defined in the form of a lower limit and an upper limit, and a given range is defined by selecting a lower limit and an upper limit, and the selected lower limit and upper limit define the boundary of a specific range. The range defined in this way includes the endpoint values, and can be arbitrarily combined, that is, any lower limit can be combined with any upper limit to form a range. For example, if the range of 60-120 and 80-110 is listed for a specific parameter, it is understood that the range of 60-110 and 80-120 is also expected. In addition, if the minimum range values ​​1 and 2 are listed, and if the maximum range values ​​3, 4 and 5 are listed, the following ranges can all be expected: 1-3, 1-4, 1-5, 2-3, 2-4 and 2-5. In the present application, unless otherwise specified, the numerical range "ab" represents the abbreviation of any real number combination between a and b, wherein a and b are real numbers. For example, the numerical range "0-5" represents that all real numbers between "0-5" have been fully listed herein, and "0-5" is just the abbreviation of these numerical combinations. In addition, when a parameter is expressed as an integer ≥ 2, it is equivalent to disclosing that the parameter is, for example, an integer of 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, etc.

[0032] If not otherwise specified, all embodiments and optional embodiments of the present application can be combined with each other to form a new technical solution.

[0033] Unless otherwise specified, all technical features and optional technical features of this application can be combined with each other to form a new technical solution.

[0034] The terms used in the following embodiments are only for the purpose of describing specific embodiments, and are not intended to be used as limitations on the present application. As used in the specification and the appended claims of the present application, the singular expressions "one", "a kind of", "said", "above", "the" and "this" are intended to also include expressions such as "one or more", unless there is a clear contrary indication in the context. It should also be understood that in the following embodiments of the present application, "at least one", "one or more" refer to one, two or more. The term "and / or" is used to describe the association relationship of associated objects, indicating that three relationships may exist; for example, A and / or B can represent: A exists alone, A and B exist at the same time, and B exists alone, where A and B can be singular or plural. The character " / " generally indicates that the objects associated before and after are in an "or" relationship.

[0035] References to "one embodiment", "some embodiments", "an example" or "some examples" described in this specification mean that a particular feature, structure or characteristic described in conjunction with the example is included in one or more examples of the present application. Thus, the phrases "in one embodiment", "in some other examples", "in some other examples", etc. appearing at different places in this specification do not necessarily all refer to the same example, but mean "one or more but not all examples", unless otherwise specifically emphasized. The terms "including", "comprising", "having" and their variations all mean "including but not limited to", unless otherwise specifically emphasized.

[0036] In the description of the embodiments of the present application, the technical terms "first", "second", etc. are only used to distinguish different description objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the meaning of "multiple" is more than two, unless otherwise clearly and specifically defined.

[0037] The present application embodiments will be described in more detail below with reference to the accompanying drawings. In each of the accompanying drawings, the same elements are represented by similar reference numerals. For the sake of clarity, the various parts in the accompanying drawings are not drawn to scale. In addition, some well-known parts may not be shown in the drawings.

[0038] As a basic optical element, optical imaging lens plays an important role in daily life, scientific research, military, medical and other aspects. With the advancement and development of science and technology, the size of optical systems has gradually developed towards miniaturization and integration, and the requirements for performance stability have also gradually increased. Therefore, optical lenses made of ordinary materials can no longer meet the requirements of fine and small optical systems. In recent years, lenses based on liquid crystal materials have gradually developed and are increasingly favored by researchers and the industry. Liquid crystal lens is a typical micro-optical element with the advantages of small size, thin thickness, easy integration, good imaging quality, and relatively short response time. Compared with traditional fixed lenses that rely on thickness, refractive index and focal length, liquid crystal lenses can achieve focal length change under electric field drive adjustment within a response time of milliseconds. Because it is a zoom device without mechanical moving parts, it has a wide range of application value in optical imaging, beam control and shaping, microfluidic sensing, adaptive optics, biomedicine, photonics and other fields.

[0039] The liquid crystal lens will design several groups of ITO driving electrode groups on the driving circuit to realize the optical properties of the modulated liquid crystal lens group. The ITO driving electrode signal is transmitted by connecting the external circuit signal to the ITO driving electrode through a via. Figure 1 FIG. 1 is a schematic diagram of the wiring of a liquid crystal lens of a related technology of the present application. Figure 1 As shown, in the electrode wiring of a general liquid crystal lens, it includes the opposite side of the data line crimping area (Data Pad Opposite, DPO) and the data line crimping area side (Data Pad Opposite, DP). The DPO side includes a collection area 11, and the PO side includes a collection area 12 and a signal introduction area 13. In the collection area 12 on the PO side, the ITO drive electrode 14 is connected to the drive electrode 15 in the collection area through a via; in the signal introduction area 13 on the PO side, the ITO drive electrode 14 is connected to the external signal and the internal signal through a via, thereby realizing the regulation of the electric field of the corresponding liquid crystal lens group.

[0040] It should be understood that the crimping area refers to the area where the signal lines in the array substrate are crimped with the leads of the external driving circuit board after the cutting and grinding process. If the following refers to the content that is relatively well known in the art, this application will not repeat it.

[0041] Figure 2 FIG. 1 is a cross-sectional view of a driving electrode in a collection area of ​​a related art of the present application. Figure 2 As shown, in the prior art, the cross-sectional structure is an inverted trapezoid. Thus, when the subsequent insulating layer is set, the insulating layer may not cover the film layer below it properly, that is, the sealing performance of the liquid crystal lens substrate is low, which may cause direct connection between different film layers, thereby causing the liquid crystal lens to short-circuit.

[0042] In view of the above problems, an embodiment of the present application provides a display substrate, which can improve the sealing performance of the display substrate, thereby improving the reliability and performance of the display device.

[0043] It should be understood that the arrangement of the display substrate described in this application is applicable to most display devices, especially liquid crystal lenses.

[0044] The display substrate and the display device described in the embodiments of the present application will be described in detail below with reference to the accompanying drawings.

[0045] Figure 3 FIG. 1 is a schematic diagram of the structure of a display substrate according to an embodiment of the present application. Figure 3 As shown, the display substrate 200 includes a substrate layer 20, and the substrate layer 20 includes a collection area 30; arranged on one side of the substrate layer 20, the collection area 30 includes a plurality of first driving electrodes 31 arranged at intervals along a first direction X, and the first driving electrodes 31 include a first electrode layer 311 and a second electrode layer 312 arranged in sequence along a second direction Y, and the second direction Y is perpendicular to the first direction X.

[0046] For example, the first direction X is as follows: Figure 3 As shown, the first direction X may also be referred to as a length direction of the display substrate 200 or the display device.

[0047] For example, the second direction Y is as follows: Figure 3 As shown, the second direction Y may also be referred to as a height direction or a thickness direction of the display substrate 200 or the display device.

[0048] The substrate layer 20 includes the collection area 30, which means that the collection area 30 is disposed in a partial area on one side of the substrate layer 20. If the substrate layer 20 is mentioned separately below, it means the separate substrate layer 20 without the collection area 30 or other areas.

[0049] Specifically, the material of the substrate layer 20 is generally glass, for example, it can be alkali-free glass, alkali-containing glass or tempered glass, etc. Of course, it can also be other materials, and the present application does not make any special limitation on this.

[0050] Specifically, the multiple mentioned in this application refers to no less than two.

[0051] Specifically, along the first direction X, the plurality of first driving electrodes 31 are arranged at intervals, which means that there are gaps between the first driving electrodes 31 and the first driving electrodes 31 are not arranged in a state of being closely adjacent to each other. That is, they are arranged in the order of first driving electrode 31, gap, first driving electrode 31, gap, and so on.

[0052] In the second direction Y, the first electrode layer 311 and the second electrode layer 312 are arranged in sequence. That is, the substrate layer 20, the first electrode layer 311, and the second electrode layer 312 are arranged in sequence from bottom to top along the second direction Y; in other words, the second electrode layer 312, the first electrode layer 311, and the substrate layer 20 are arranged in sequence from top to bottom along the second direction Y. That is, the first electrode layer 311 is located below the second electrode layer 312.

[0053] The projection of the first electrode layer 311 in the first direction X covers the projection of the second electrode layer 312 in the first direction X.

[0054] In the first direction X, the projection of the first electrode layer 311 covers the projection of the second electrode layer 312, which means that in the first direction X, the projection of the first electrode layer 311 is larger than the projection of the second electrode layer 312, and the projection of the first electrode layer 311 needs to completely cover the projection of the second electrode layer 312. Therefore, it can be said that the cross-sectional structure of the first driving electrode 31 presents a "positive trapezoidal" structure.

[0055] It should be understood that the projection here refers to the orthographic projection.

[0056] In the above scheme, the display substrate 200 includes a substrate layer 20 and a collection area 30 arranged on one side of the substrate layer 20. The collection area 30 includes a plurality of first driving electrodes 31 arranged along the first direction X; further, the first driving electrode 31 includes a first electrode layer 311 and a second electrode layer 312. The first electrode layer 311 is located below the second electrode layer 312, and the projection of the first electrode layer 311 in the first direction X completely covers the projection of the second electrode layer 312 in the first direction X, so that the first driving electrode 31 presents a "positive trapezoidal" cross-sectional structure, so that when the subsequent insulating film layer is set, the insulating film layer will not have poor coverage of the first driving electrode 31 due to the bottom cut angle, and then there will be a risk of short circuit of the display device caused by poor coverage, which is conducive to improving the reliability of the display device.

[0057] It should be noted that the present application does not specifically limit the process of how the display substrate 200 presents a "normal trapezoidal" structure. For example, a post-baking process can be added after etching the second electrode layer 312, and in the post-baking process, a temperature of 100° C. to 200° C. is used for a processing time of 120 seconds to 300 seconds.

[0058] In some embodiments, the first electrode layer 311 includes a first transparent electrode layer, and the second electrode layer includes a first metal electrode layer.

[0059] In the above solution, when the first electrode layer 311 is the first transparent electrode layer and the second electrode layer 312 is the first metal electrode layer, a structure is formed in which the first transparent electrode layer is at the bottom and the first metal electrode layer is at the top.

[0060] In some embodiments, the first electrode layer 311 includes a first metal electrode layer, and the second electrode layer 312 includes a first transparent electrode layer.

[0061] In the above solution, when the first electrode layer 311 is the first metal electrode layer and the second electrode layer 312 is the first transparent electrode layer, a structure is formed in which the first metal electrode layer is at the bottom and the first transparent electrode layer is at the top. As described above, a via hole is provided on the first driving electrode 31 to connect with other driving electrodes. When the first metal electrode layer is located at the bottom layer, the risk of completely etching away the metal when etching the via hole can be reduced.

[0062] Figure 4 FIG. 1 is a schematic diagram of the structure of a display substrate according to another embodiment of the present application. Figure 4 As shown, in some embodiments, the substrate layer 20 further includes a signal introduction region 40, and the signal introduction region 40 and the collection region 30 are sequentially arranged on one side of the substrate layer 20 along the first direction X; the signal introduction region 40 includes a first transparent electrode layer.

[0063] like Figure 4 As shown, when the first electrode layer 311 is a first metal electrode layer and the second electrode layer 312 is a first transparent electrode layer, the film layers in the collection area 30 and the signal introduction area 40 are as shown in FIG. Figure 4 That is, the signal introducing area 40 may not include the first driving electrode 31 .

[0064] Please continue to refer to Figure 3 .like Figure 3 As shown, in some embodiments, the substrate layer 20 also includes a signal introduction area 40, and the signal introduction area 40 and the collection area 30 are arranged in sequence along the first direction X. The signal introduction area 40 includes a first introduction area 410 and a second introduction area 420 arranged along the first direction X, and the first introduction area 410 is located between the collection area 30 and the second introduction area 420.

[0065] Specifically, on one side of the substrate layer 20 , the line collection area 30 , the first lead-in area 410 , and the second lead-in area 420 are sequentially arranged along the first direction X. That is, it can be said that the line collection area 30 , the first lead-in area 410 , and the second lead-in area 420 are sequentially arranged from left to right; or it can be said that the line collection area 30 is located on the left side of the signal lead-in area 40 .

[0066] The first introduction region 410 includes a first transparent electrode layer, and the second introduction region 420 includes a first driving electrode 31 .

[0067] The first driving electrode 31 includes a first electrode layer 311 and a second electrode layer 312. The second introduction region 420 also includes the first driving electrode 31, that is, the second introduction region 420 also includes the first electrode layer 311 and the second electrode layer 312.

[0068] The first electrode layer 311 in the first driving electrode 31 may be a first transparent electrode layer or a first metal electrode layer. It should be noted that the arrangement order of the film layers of the first driving electrode 31 in the second introduction area 420 must be the same as the arrangement order of the film layers of the first driving electrode 31 in the line collection area 30. In other words, when the first driving electrode 31 in the line collection area 30 has the first metal electrode layer at the bottom and the first transparent electrode layer at the top, the first driving electrode 31 in the second introduction area 420 also has the first metal electrode layer at the bottom and the first transparent electrode layer at the top, and vice versa.

[0069] Specifically, the area of ​​the signal introduction region 40 close to the collection area 30 is only configured as a single layer of the first transparent electrode film layer, and the area away from the collection area 30 maintains the same film layer configuration as the collection area 30 .

[0070] In the above scheme, by making the area of ​​the signal introduction area 40 close to the collection area 30 adopt a single-layer transparent electrode layer setting, and the part far away from the collection area 30 adopts the same film layer setting as the collection area 30, this can not only reduce the height of the subsequent driving electrode climbing step and reduce the risk of wire breaking at the step, but also improve the signal transmission rate at the signal introduction area 40.

[0071] Figure 5 FIG. 1 is a schematic diagram of the structure of a display substrate according to another embodiment of the present application. Figure 5 As shown, the display substrate 200 also includes an insulating layer 50; the insulating layer 50 is arranged on the side of the collection area 30 and the signal introduction area 40 away from the substrate layer 20; the material of the insulating layer 50 includes at least one of Si3N4 and SiO2; in the second direction Y, the size of the insulating layer 50 is 100nm-300nm.

[0072] The insulating layer 50 is arranged on the side of the wiring collection area 30 and the signal introduction area 40 away from the substrate layer 20. That is, in the second direction Y, the substrate layer 20, the wiring collection area 30 and the insulating layer 50 are arranged in sequence; or it can be said that the insulating layer 50 is arranged above the wiring collection area 30 and the signal introduction area 40.

[0073] Specifically, the material of the insulating layer 50 includes at least one of Si3N4 and SiO2. Of course, the insulating layer 50 may also be other materials commonly used in the industry, and the present application does not limit this.

[0074] Specifically, in the second direction Y, the size of the insulating layer 50 can be 100 nm, 120 nm, 150 nm, 200 nm, 260 nm, 300 nm or any value within the above range.

[0075] Figure 6 This is a front view of a display substrate according to an embodiment of the present application. Figure 5 and Figure 6 In some embodiments, the display substrate 200 further includes a second driving electrode layer 60, and the insulating layer 50 is located between the substrate layer 20 and the second driving electrode layer 60; the material of the second driving electrode layer 60 includes indium tin oxide; in the second direction Y, the size of the second driving electrode layer 60 is 20nm-60nm; in the third direction Z, the size of the second driving electrode layer 60 is 2μm-4μm, and the third direction Z is perpendicular to the first direction X and the second direction Y.

[0076] When the display device is a liquid crystal lens, the second driving electrode layer 60 can adjust the shape of the lens.

[0077] For example, the third direction Z is as follows Figure 6 As shown, the third direction Z may also be referred to as a width direction of the display substrate 200 or the display device.

[0078] Specifically, the substrate layer 20 , the collection area 30 , the insulating layer 50 and the second driving electrode layer 60 are sequentially arranged along the second direction Y. The insulating layer 50 is arranged between the substrate layer 20 and the second driving electrode layer 60 , that is, the second driving electrode layer 60 is arranged above the insulating layer 50 .

[0079] Specifically, in the second direction Y, the size of the second driving electrode layer 60 can be 20 nm, 30 nm, 45 nm, 50 nm, 60 nm or any value within the above range.

[0080] Specifically, in the third direction Z, the size of the second driving electrode layer 60 is 2 μm, 2.5 μm, 3 μm, 3.6 μm, 4 μm or any value within the above range.

[0081] Please continue to refer to Figure 5 and Figure 6 In some embodiments, the insulating layer 50 is provided with a first via 510 and a second via 520 . The first via 510 is provided on the insulating layer 50 corresponding to the collection area 30 in the first direction X, and the second via 520 is provided on the insulating layer 50 corresponding to the signal introduction area 40 in the first direction X.

[0082] The first via hole 510 and the second via hole 520 are both disposed on the insulating layer 50 . In the first direction X, the first via hole 510 corresponds to the line collection area 30 , and the second via hole 520 corresponds to the signal introduction area 40 .

[0083] In the above solution, by providing the first via hole 510 corresponding to the collection area 30 and the second via hole 520 corresponding to the signal introduction area 40 on the insulating layer 50, the connection between different film layers can be achieved.

[0084] It should be understood that when via holes are provided on the insulating layer 50 , via holes should also exist on the second driving electrode layer 60 provided above the insulating layer 50 to ensure that the morphologies of the insulating layer 50 and the second driving electrode layer 60 are uniform.

[0085] It should be understood that, in order to achieve connection between different film layers, in the second direction Y, the via hole should penetrate the insulating layer so that the first driving electrode 31 is in contact with the second driving electrode layer 60 .

[0086] in addition, Figure 6 The state where a second driving electrode layer 60 is set with the collection area 30. In actual products, multiple second driving electrode layers 60 and the collection area 30 are set along the third direction Z. Of course, each second driving electrode layer 60 should be provided with a first via 510 to achieve connection with the first driving electrode 31. Here, it can be set according to the conventional setting, and this application will not be repeated here.

[0087] Specifically, in Figure 6 In the front view shown, in order to achieve reasonable wiring, in the second direction Y, the size between the plurality of first driving electrodes 31 may be 3 μm-5 μm, and the size of the first electrode layer may be 10 μm-20 μm.

[0088] In some embodiments, the hole density of the first via hole 510 and the hole density of the second via hole 520 are 0.0004 / μm. -2 .

[0089] When etching the second via hole 520 in the signal introduction area 40, the insulating layer 50 is easily etched too fast, resulting in an over-etching problem of the first metal electrode layer, and even causing the metal electrode in the second via hole 520 to be completely etched away, resulting in a problem of poor overlap between the second drive electrode layer 60 and the first drive electrode 31. Therefore, by appropriately increasing the hole density of the second via hole 520, increasing the hole density of the second via hole 520 to the same as that of the first via hole 510, it is possible to prevent the via hole in the signal introduction area 40 from being severely over-etched, thereby causing the metal electrode layer to be etched through.

[0090] As described above, the signal introduction area 40 may include the first transparent electrode layer but not the first driving electrode 31; or may include the first introduction area 410 close to the collection area 30 and the second introduction area 420 far from the collection area 30, wherein the first introduction area 410 includes the first transparent electrode layer and the second introduction area 420 includes the first driving electrode 31, that is, the first driving electrode 31 in the collection area 30 is arranged in the same manner as the first driving electrode 31 in the second introduction area 420. Therefore, the different film layer arrangements of the signal introduction area 40 affect the specific arrangement of the second via 520.

[0091] Figure 7This is a schematic diagram of the structure of the second via hole in one embodiment of the present application. Figure 7 middle, Figure 7 (a) shows that the signal introduction area 40 includes a first transparent electrode layer, and the second via hole 520 is disposed on the first transparent electrode layer. Figure 7 (b)-7(e) indicates that the signal introduction area 40 includes a first transparent electrode layer and a first driving electrode 31, wherein Figure 7 (b) and 7 (e) show that in the first driving electrode 31, the first transparent electrode layer is at the bottom and the first metal layer is at the top. Figure 7 (b) The vias are multiple elliptical vias arranged along the first direction X, Figure 7 (e) The via hole is a large rectangular hole; Figure 7 (c) and 7 (d) show that in the first driving electrode 31, the first metal layer is at the bottom and the first transparent electrode layer is at the top. Figure 7 (c) The vias are multiple elliptical vias arranged along the first direction X, Figure 7 (d) The vias are large rectangular holes.

[0092] That is to say, the present application does not specifically limit the specific shape and specific location of the second via hole 520. The second via hole 520 may be Figure 7 In some cases, the second via 520 may also be a plurality of square vias arranged along the first direction X; for another example, when the signal introduction area 40 also includes the first driving electrode 31 , the second via 520 may also be arranged in the first introduction area 410 close to the collection area 30 .

[0093] It should be noted that the present application only discusses the arrangement of the first transparent electrode layer and the first driving electrode 31 in the signal introduction area 40, and does not discuss whether the signal introduction area 40 includes other conventional arrangements, such as Figure 7 As shown in (a), the signal introduction area 40 also includes a second metal electrode layer 80 for connecting to external signals.

[0094] In some embodiments, the material of the first transparent electrode layer includes at least one of indium tin oxide, indium zinc oxide, and zinc aluminum oxide.

[0095] In some embodiments, the material of the first metal electrode layer includes at least one of Al, Mo, Cu, Au, Ti, Ni, and Ag.

[0096] In some embodiments, in the second direction Y, a size of the first transparent electrode layer is 40 nm-80 nm, and a size of the first metal electrode layer is 100 nm-200 nm.

[0097] Specifically, in the second direction Y, the size of the first transparent electrode layer can be 40nm, 45nm, 58nm, 66nm, 80nm or any value within the above range; the size of the first metal electrode layer can be 100nm, 120nm, 150nm, 178nm, 200nm or any value within the above range.

[0098] In some embodiments, the display substrate 200 further includes an organic resin film, and the second driving electrode layer 60 is located between the organic resin film and the insulating layer 50 .

[0099] The organic resin film is disposed above the second driving electrode layer 60 to planarize the display substrate 200 .

[0100] The following is a brief description of the steps for preparing the display substrate described in the above embodiment:

[0101] First, a substrate layer is selected, a first electrode layer is formed on the substrate layer by magnetron sputtering, and a second electrode layer is prepared by magnetron sputtering and photolithography to form a pattern;

[0102] Secondly, the second electrode layer is modified by a post-baking process, and then the first electrode layer is etched;

[0103] Then, an insulating layer is deposited by vapor deposition;

[0104] Then, a photolithography process and dry etching are used to obtain a first via hole and a second via hole;

[0105] Then, a second driving electrode layer is obtained by using a photolithography process;

[0106] Finally, an organic resin film is used for planarization.

[0107] It should be noted that, during the via etching process, the etching gas may be a mixture of SF6 and O2, the preferred etching power range may be 3-10KW, preferably 6KW, and the gas ratio of the etching gas SF6 and O2 may be 1:2 to 1:4.

[0108] An embodiment of the present application also provides a display device, comprising a display substrate in any of the above possible embodiments.

[0109] The display device may be a display device such as an OLED display, and any product or component with a display function such as a television, a digital camera, a mobile phone, a tablet computer, etc. including these display devices.

[0110] It should be noted that the present application is not limited to the above-mentioned embodiments. The above-mentioned embodiments are only examples, and the embodiments having the same structure as the technical idea and exerting the same effect within the scope of the technical solution of the present application are all included in the technical scope of the present application. In addition, without departing from the scope of the main purpose of the present application, various modifications that can be thought of by those skilled in the art to the embodiments and other methods of combining some of the constituent elements in the embodiments are also included in the scope of the present application.

Claims

1. A display substrate, characterized in that: include: a substrate layer, the substrate layer comprising a wiring collection area; The collection line area is arranged at one side of the substrate layer, and includes a plurality of first driving electrodes arranged at intervals along a first direction, and the first driving electrodes include a first electrode layer and a second electrode layer arranged in sequence along a second direction, and the second direction is perpendicular to the first direction; in, The projection of the first electrode layer in the first direction covers the projection of the second electrode layer in the first direction.

2. The display substrate according to claim 1, characterized in that: The first electrode layer includes a first transparent electrode layer, and the second electrode layer includes a first metal electrode layer; or The first electrode layer includes the first metal electrode layer, and the second electrode layer includes the first transparent electrode layer.

3. The display substrate according to claim 2, characterized in that: The substrate layer further comprises a signal introduction area, wherein the signal introduction area and the line collection area are sequentially arranged on one side of the substrate layer along the first direction; The signal introduction area includes the first transparent electrode layer.

4. The display substrate according to claim 2, characterized in that: The substrate layer further comprises a signal introduction area, the signal introduction area and the line collection area are sequentially arranged along the first direction, the signal introduction area comprises a first introduction area and a second introduction area arranged along the first direction, and the first introduction area is located between the line collection area and the second introduction area; The first introduction region includes the first transparent electrode layer, and the second introduction region includes the first driving electrode.

5. The display substrate according to claim 3 or 4, characterized in that: The display substrate further includes an insulating layer; The insulating layer is arranged on a side of the wiring collection area and the signal introduction area away from the substrate layer; The material of the insulating layer includes at least one of Si3N4 and SiO2; In the second direction, the size of the insulating layer is 100 nm-300 nm.

6. The display substrate according to claim 5, characterized in that: The display substrate further includes a second driving electrode layer, and the insulating layer is located between the substrate layer and the second driving electrode layer; The material of the second driving electrode layer includes indium tin oxide; In the second direction, the size of the second driving electrode layer is 20nm-60nm; In the third direction, the size of the second driving electrode layer is 2 μm-4 μm, and the third direction is perpendicular to the first direction and the second direction.

7. The display substrate according to claim 6, characterized in that: The insulating layer is provided with a first via hole and a second via hole. The first via hole is provided on the insulating layer corresponding to the line collection area in the first direction. The second via hole is provided on the insulating layer corresponding to the signal introduction area in the first direction.

8. The display substrate according to claim 7, characterized in that: The hole density of the first via hole and the hole density of the second via hole are 0.0004 / μm -2 .

9. The display substrate according to any one of claims 6 to 8, characterized in that: The material of the first transparent electrode layer includes at least one of indium tin oxide, indium zinc oxide, and zinc aluminum oxide; The material of the first metal electrode layer includes at least one of Al, Mo, Cu, Au, Ti, Ni, and Ag.

10. The display substrate according to any one of claims 6 to 8, characterized in that: In the second direction, a size of the first transparent electrode layer is 40 nm-80 nm, and a size of the first metal electrode layer is 100 nm-200 nm.

11. The display substrate according to any one of claims 6 to 8, characterized in that: The display substrate further comprises an organic resin film, and the second driving electrode layer is located between the organic resin film and the insulating layer; In the second direction, the size of the organic resin film is 2 μm-5 μm.

12. A display device, characterized in that: include: A display substrate as claimed in any one of claims 1 to 11.

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