Vacuum impregnation device for polymer tantalum capacitor production

Abstract

The utility model provides a vacuum impregnation device for polymer tantalum capacitor production, which relates to the technical field of polymer tantalum capacitor production and processing and comprises a device body, a pretreatment mechanism is arranged on the device body and comprises a placing groove, a high-voltage power supply is mounted on one side of the inner wall of the placing groove, and the high-voltage power supply is connected with the high-voltage power supply. A controller is installed on one side of the inner wall of the containing groove, a draught fan is installed at the bottom of the inner wall of the containing groove, hoses are installed at the output end of the draught fan and the input end of the draught fan, a guide pipe is installed at the output end of one hose, and an insulation shell is installed at the bottom of the inner wall of the containing groove. According to the vacuum impregnation device, by arranging the pretreatment mechanism, the production efficiency of the vacuum impregnation device can be improved, the using effect of the vacuum impregnation device is improved, and meanwhile the using efficiency of the vacuum impregnation device is also improved.

Description

Technical Field

[0001] The utility model relates to the technical field of production and processing of polymer tantalum capacitors, in particular to a vacuum impregnation device for the production of polymer tantalum capacitors. Background Art

[0002] Polymer tantalum capacitor is an electronic component that uses tantalum metal film as the positive electrode material, polymer as the dielectric, and carbon material or metal as the negative electrode material. Its production process usually includes raw material preparation, electrode preparation, vacuum impregnation, testing and sorting, among which vacuum impregnation requires a vacuum impregnation device.

[0003] However, in the prior art, although the existing vacuum impregnation device for the production of polymer tantalum capacitors can complete the vacuum impregnation operation of the production of polymer tantalum capacitors, it does not have the function of performing pretreatment operations on the tantalum capacitors before the vacuum impregnation operation, which leads to limited production efficiency of the vacuum impregnation device, which not only reduces the use effect of the vacuum impregnation device for the production of polymer tantalum capacitors, but also reduces the use efficiency of the vacuum impregnation device for the production of polymer tantalum capacitors.

[0004] Therefore, we propose a vacuum impregnation device for the production of polymer tantalum capacitors to solve the technical problems raised in the background technology. Utility Model Content

[0005] The purpose of the utility model is to solve the problem that the existing vacuum impregnation device for the production of polymer tantalum capacitors in the prior art does not have the function of performing pretreatment operations on the tantalum capacitors before the vacuum impregnation operation, which leads to limited production efficiency of the vacuum impregnation device, reduces the use effect of the vacuum impregnation device for the production of polymer tantalum capacitors, and also reduces the use efficiency of the vacuum impregnation device for the production of polymer tantalum capacitors. A vacuum impregnation device for the production of polymer tantalum capacitors is proposed.

[0006] In order to achieve the above-mentioned purpose, the utility model adopts the following technical scheme: a vacuum impregnation device for polymer tantalum capacitor production, comprising a device body, on which a pretreatment mechanism is provided;

[0007] The pretreatment mechanism includes a placement groove, a high-voltage power supply is installed on one side of the inner wall of the placement groove, a controller is installed on one side of the inner wall of the placement groove, a fan is installed on the bottom of the inner wall of the placement groove, and hoses are installed at the output end and the input end of the fan, and a conduit is installed at the output end of one of the hoses, an insulating shell is installed at the bottom of the inner wall of the placement groove, a dust collecting electrode is fixed inside the insulating shell, an insulator is installed at the top through hole of the insulating shell, a corona electrode is fixedly sleeved inside the insulator, a dust collecting box is movably sleeved inside the dust collecting electrode near the bottom, and a laser ranging sensor is installed at the top opening of the inner wall of the placement groove.

[0008] Preferably, the top of the conduit is fixedly inserted through the top of the inner wall of the placement groove, and the input end of the other hose is installed with the output end of the insulating shell.

[0009] Preferably, the bottom of the insulator movably passes through the top of the dust collecting pole, and the bottom of the dust collecting box and the bottom of the insulating shell are on the same horizontal plane.

[0010] Preferably, the high-voltage power supply is electrically connected to the controller, the laser ranging sensor is electrically connected to the controller, and the fan is electrically connected to the controller.

[0011] Preferably, the high-voltage power supply is electrically connected to the dust collecting electrode via a first wire, and the corona electrode is electrically connected to the high-voltage power supply via a second wire.

[0012] Preferably, the input end of the insulating shell is connected to the lower opening of the dust collecting electrode, the output end of the insulating shell is connected to the upper opening of the dust collecting electrode, and the placement groove is opened on the front surface of the device body.

[0013] Preferably, a placement plate is installed at the notch of the placement groove, and four ventilation holes are opened on the front surface of the placement plate near the bottom.

[0014] Compared with the prior art, the advantages and positive effects of the utility model are:

[0015] 1. In the utility model, by setting a pretreatment mechanism, the production efficiency of the vacuum impregnation device can be improved, which not only improves the use effect of the vacuum impregnation device, but also improves the use efficiency of the vacuum impregnation device. Through the cooperation of the first wire, the second wire, the dust collecting electrode, the corona electrode, the insulator and the high-voltage power supply, the dust carried in the air entering the dust collecting electrode can be attracted by static electricity and adsorbed and collected on the inner wall of the dust collecting electrode. Through the cooperation of the fan and the hose, the treated air discharged from the output end of the dust collecting electrode can be transported to the inside of the conduit.

[0016] 2. The utility model can prevent the components inside the placement slot from being affected in their normal operation due to collision by external forces under the action of the placement plate, and can allow the input end of the insulating shell to absorb external air through the action of the ventilation holes. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 A three-dimensional diagram of a vacuum impregnation device for producing polymer tantalum capacitors proposed by the utility model;

[0018] Figure 2 A partial stereogram of a vacuum impregnation device for producing polymer tantalum capacitors proposed by the utility model;

[0019] Figure 3 This is a partial three-dimensional diagram of the pretreatment mechanism of a vacuum impregnation device for polymer tantalum capacitor production proposed by the utility model;

[0020] Figure 4 The utility model provides a partially cutaway stereoscopic diagram of a vacuum impregnation device for producing polymer tantalum capacitors.

[0021] Legend: 1. Device body; 2. Pretreatment mechanism; 201. Placement slot; 202. High-voltage power supply; 203. Controller; 204. Fan; 205. Hose; 206. Insulation shell; 207. Dust collecting electrode; 208. Insulator; 209. Corona electrode; 210. Dust collecting box; 211. Conduit; 212. Laser ranging sensor; 3. Placement plate; 4. Ventilation hole. DETAILED DESCRIPTION

[0022] In order to more clearly understand the above-mentioned purpose, features and advantages of the utility model, the utility model is further described below in conjunction with the accompanying drawings and embodiments. It should be noted that the embodiments of the present application and the features in the embodiments can be combined with each other without conflict.

[0023] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments of the following disclosure.

[0024] like Figure 1-Figure 4 As shown, the utility model provides a vacuum impregnation device for polymer tantalum capacitor production, comprising a device body 1, on which a pretreatment mechanism 2 is arranged;

[0025] The pretreatment mechanism 2 includes a placement tank 201, a high-voltage power supply 202 is installed on one side of the inner wall of the placement tank 201, a controller 203 is installed on one side of the inner wall of the placement tank 201, a fan 204 is installed at the bottom of the inner wall of the placement tank 201, and hoses 205 are installed at the output end and the input end of the fan 204, and a conduit 211 is installed at the output end of one of the hoses 205, an insulating shell 206 is installed at the bottom of the inner wall of the placement tank 201, and a wire installation hole is opened on the outer wall of the insulating shell 206, a dust collecting pole 207 is fixed inside the insulating shell 206, an insulator 208 is installed at the top through hole of the insulating shell 206, a corona pole 209 is fixedly sleeved inside the insulator 208, a dust collecting box 210 is movably sleeved inside the dust collecting pole 207 near the bottom, a laser ranging sensor 212 is installed at the top opening of the inner wall of the placement tank 201, and the top of the conduit 211 is fixedly penetrated through the placement tank 201. At the top of the inner wall, the input end of another hose 205 is installed with the output end of the insulating shell 206, the bottom of the insulator 208 movably passes through the top of the dust collecting electrode 207, the bottom of the dust collecting box 210 and the bottom of the insulating shell 206 are on the same horizontal plane, the high-voltage power supply 202 is electrically connected to the controller 203, the laser ranging sensor 212 is electrically connected to the controller 203, the fan 204 is electrically connected to the controller 203, the high-voltage power supply 202 is electrically connected to the dust collecting electrode 207 through a first wire, the corona electrode 209 is electrically connected to the high-voltage power supply 202 through a second wire, the input end of the insulating shell 206 is connected to the lower opening of the dust collecting electrode 207, the output end of the insulating shell 206 is connected to the upper opening of the dust collecting electrode 207, the placement groove 201 is opened on the front surface of the device body 1, and a placement plate 3 is installed at the notch of the placement groove 201, and four ventilation holes 4 are opened on the front surface of the placement plate 3 near the bottom.

[0026] The effect achieved is that when the tantalum capacitor needs to be pre-treated before the vacuum impregnation operation, the placement plate 3 is first removed, and then the controller 203 and the high-voltage power supply 202 are connected to the external power supply, and then the controller 203 is turned on, and the distance threshold (when the staff pre-treats the tantalum capacitor on the upper side of the device body 1, the distance between the staff's hand and the upper side of the device body 1) and the use procedure are set, and then the tantalum capacitor that needs to be pre-treated is clamped and fixed with a clip, and then the staff moves the clamped tantalum capacitor to the top of the catheter 211. At this time, the position of the staff's hand is just above the laser distance sensor 212. At the same time, the laser distance sensor 212 will also detect the upper side of the device body 1 and The distance between the staff's hands is measured, and the detected distance data is directly transmitted to the controller 203 in the form of an electrical signal. Then the controller 203 compares the received distance data with the distance threshold value set in advance by the controller 203. When the distance data received by the controller 203 is higher than the distance threshold value set in advance by the controller 203, the controller 203 will not start the fan 204 and the high-voltage power supply 202. When the distance data received by the controller 203 is lower than the distance threshold value set in advance by the controller 203, the controller 203 will directly start the high-voltage power supply 202 and the fan 204 at the same time. At this time, the started high-voltage power supply 202 will allow the dust collecting electrode 207 and the corona electrode 209 to interact with each other to generate an electrostatic magnetic field. The started fan 204 will generate suction at the input end of the other hose 205, and then the input end of the other hose 205 will directly allow the input end of the connected insulating shell 206 to obtain suction, and inhale air from the outside, and then transport it to the inside of the dust collecting pole 207. After that, the air entering the dust collecting pole 207 will, under the action of the electrostatic magnetic field, adsorb the dust carried in the air on the inner wall of the dust collecting pole 207. Then, the air with dust removed will be transported into the inside of one of the hoses 205 with the cooperation of the other hose 205 and the fan 204, and then transported into the inside of the conduit 211. At this time, the air entering the conduit 211 will be ejected from the output end of the conduit 211, and the air ejected from the output end of the conduit 211 will be ejected from the output end of the conduit 211. The dust-free air released will directly clean the dust on the outer surface of the tantalum capacitor directly above the conduit 211. When the dust on the outer surface of the tantalum capacitor is cleaned, the staff will put the tantalum capacitor into a dust-free placement box prepared in advance. When the staff's hand leaves the upper side of the device body 1, the controller 203 will directly turn off the fan 204 and the high-voltage power supply 202 at the same time. The turned-off high-voltage power supply 202 will also make the electrostatic magnetic field generated between the dust collecting electrode 207 and the corona electrode 209 disappear. When the electrostatic magnetic field disappears, the dust adsorbed and collected on the inner wall of the dust collecting electrode 207 will directly fall into the dust collecting box 210 for collection under the action of its own gravity. When an appropriate amount of pre-treated tantalum capacitors are collected in the dust-free placement box,At this time, the device body 1 can be directly used to perform the immersion operation on the tantalum capacitor.

[0027] Working principle: When the tantalum capacitor needs to be pre-treated before vacuum impregnation, the placement plate 3 is first removed, and then the controller 203 and the high-voltage power supply 202 are connected to the external power supply. Then the controller 203 is turned on, and the distance threshold (the distance between the staff's hand and the upper side of the device body 1 when the staff pre-treats the tantalum capacitor on the upper side of the device body 1) and the usage procedure are set. Then the tantalum capacitor that needs to be pre-treated is clamped and fixed with a clip. Then the staff moves the clamped tantalum capacitor to the top of the catheter 211. At this time, the position of the staff's hand is just above the laser distance sensor 212. At the same time, the laser distance sensor 212 will also measure the distance between the upper side of the device body 1 and the staff's hand. The controller 203 measures the distance and transmits the detected distance data directly to the controller 203 in the form of an electrical signal. Then the controller 203 compares the received distance data with the distance threshold value set in advance by the controller 203. When the distance data received by the controller 203 is higher than the distance threshold value set in advance by the controller 203, the controller 203 will not start the fan 204 and the high-voltage power supply 202. When the distance data received by the controller 203 is lower than the distance threshold value set in advance by the controller 203, the controller 203 will directly start the high-voltage power supply 202 and the fan 204 at the same time. At this time, the started high-voltage power supply 202 will make the dust collecting electrode 207 and the corona electrode 209 interact with each other to generate an electrostatic magnetic field. At the same time, the started fan 204 will make the other soft Suction is generated at the input end of the tube 205, and then the input end of the other hose 205 directly allows the input end of the insulating shell 206 connected to it to obtain suction, and inhales air from the outside, and then transports it to the inside of the dust collecting electrode 207. After that, the air entering the dust collecting electrode 207 will, under the action of the electrostatic magnetic field, adsorb the dust carried in the air on the inner wall of the dust collecting electrode 207. Then, the air without dust will be transported to the inside of one of the hoses 205 with the cooperation of the other hose 205 and the fan 204, and then transported to the inside of the conduit 211. At this time, the air entering the conduit 211 will be ejected from the output end of the conduit 211, and the dust-free air ejected from the output end of the conduit 211 will directly enter the conduit 2 11. Blow clean the dust on the outer surface of the tantalum capacitor directly above. When the dust on the outer surface of the tantalum capacitor is blown clean, the staff will put the tantalum capacitor into a dust-free placement box prepared in advance. When the staff's hand leaves the upper side of the device body 1, the controller 203 will directly turn off the fan 204 and the high-voltage power supply 202 at the same time. At this time, the turned-off high-voltage power supply 202 will also make the electrostatic magnetic field generated between the dust collecting electrode 207 and the corona electrode 209 disappear. When the electrostatic magnetic field disappears, the dust adsorbed and collected on the inner wall of the dust collecting electrode 207 will directly fall into the dust collecting box 210 for collection under the action of its own gravity. When an appropriate amount of pre-treated tantalum capacitor is collected in the dust-free placement box, the tantalum capacitor can be directly impregnated using the device body 1.

[0028] Among them, the first wire and the second wire are both wires used in reality, and the wire installation hole is for facilitating the connection between the high-voltage power supply 202 and the dust collecting electrode 207 using the first wire. The controller 203 is a PLC controller.

[0029] The device body 1 is a vacuum impregnation device, which is composed of a vacuum system, an impregnation tank, a heating system, and a control system auxiliary system;

[0030] 1. Vacuum system: used to evacuate the material to be processed to remove air and other gases.

[0031] 2. Impregnation cylinder: used to contain the impregnation liquid and immerse the material to be treated into it.

[0032] 3. Heating system: used to heat the impregnation liquid to improve the impregnation effect.

[0033] 4. Control system: used to control the operation of the equipment, including parameters such as vacuum degree, temperature, and immersion time.

[0034] 5. Auxiliary system: used for exhaust gas treatment to prevent harmful gases from polluting the environment.

[0035] Simple working principle: In the vacuum impregnation equipment, the pretreated material (such as polymer tantalum capacitor) is placed in the impregnation cylinder, and then the air and other gases inside the material are extracted through the vacuum system to form a vacuum environment. The impregnation liquid is then heated by the heating system, and then the heated impregnation liquid is injected into the impregnation cylinder. When an appropriate amount of impregnation liquid is injected into the impregnation cylinder, the material will be surrounded by the impregnation liquid under a vacuum environment. At this time, the material will be penetrated into the interior by the impregnation liquid during the impregnation process, that is, the performance and reliability of the material are improved under the action of the impregnation liquid. When the material is impregnated, the impregnation liquid in the impregnation cylinder is directly extracted, and then the material is taken out of the impregnation cylinder for subsequent processing operations.

[0036] The wiring diagram of the first wire, the second wire, the dust collecting electrode 207, the corona electrode 209, the fan 204, the controller 203, the laser ranging sensor 212, the high-voltage power supply 202 and the external power supply in the utility model belongs to the common knowledge in the field, and its working principle is a well-known technology. The model is selected according to the actual use. The control mode and wiring arrangement of the high-voltage power supply 202, the controller 203, the dust collecting electrode 207, the corona electrode 209, the fan 204 and the laser ranging sensor 212 are no longer explained in detail.

[0037] The above description is only a preferred embodiment of the present invention and does not limit the present invention in other forms. Any technician familiar with the profession may use the technical content disclosed above to change or modify it into an equivalent embodiment with equivalent changes and apply it to other fields. However, any simple modification, equivalent change and modification made to the above embodiment based on the technical essence of the present invention without departing from the content of the technical solution of the present invention still falls within the protection scope of the technical solution of the present invention.

Claims

1. A vacuum impregnation device for producing polymer tantalum capacitors, characterized in that: It comprises a device body (1), on which a pretreatment mechanism (2) is arranged; The pretreatment mechanism (2) comprises a placement tank (201), a high voltage power supply (202) is installed on one side of the inner wall of the placement tank (201), a controller (203) is installed on one side of the inner wall of the placement tank (201), a fan (204) is installed at the bottom of the inner wall of the placement tank (201), and hoses (205) are installed at both the output end and the input end of the fan (204), wherein a conduit (211) is installed at the output end of one of the hoses (205), and the placement tank An insulating shell (206) is installed at the bottom of the inner wall of (201), a dust collecting electrode (207) is fixed inside the insulating shell (206), an insulator (208) is installed at the top through hole of the insulating shell (206), a corona electrode (209) is fixedly sleeved inside the insulator (208), a dust collecting box (210) is movably sleeved inside the dust collecting electrode (207) near the bottom, and a laser distance measuring sensor (212) is installed at the top opening of the inner wall of the placement slot (201).

2. The vacuum impregnation device for polymer tantalum capacitor production according to claim 1, characterized in that: The top of the conduit (211) is fixedly connected to the top of the inner wall of the placement groove (201), and the input end of the other hose (205) is installed with the output end of the insulating shell (206).

3. The vacuum impregnation device for producing polymer tantalum capacitors according to claim 1, characterized in that: The bottom of the insulator (208) movably passes through the top of the dust collecting pole (207), and the bottom of the dust collecting box (210) and the bottom of the insulating shell (206) are on the same horizontal plane.

4. The vacuum impregnation device for producing polymer tantalum capacitors according to claim 1, characterized in that: The high-voltage power supply (202) is electrically connected to the controller (203), the laser distance sensor (212) is electrically connected to the controller (203), and the fan (204) is electrically connected to the controller (203).

5. The vacuum impregnation device for producing polymer tantalum capacitors according to claim 1, characterized in that: The high-voltage power supply (202) is electrically connected to the dust collecting electrode (207) via a first conductive wire, and the corona discharge electrode (209) is electrically connected to the high-voltage power supply (202) via a second conductive wire.

6. The vacuum impregnation device for producing polymer tantalum capacitors according to claim 1, characterized in that: The input end of the insulating shell (206) is connected to the lower opening of the dust collecting electrode (207), the output end of the insulating shell (206) is connected to the upper opening of the dust collecting electrode (207), and the placement groove (201) is provided on the front surface of the device body (1).

7. The vacuum impregnation device for producing polymer tantalum capacitors according to claim 1, characterized in that: A placement plate (3) is installed at the notch of the placement groove (201), and four ventilation holes (4) are provided on the front surface of the placement plate (3) near the bottom.

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