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Vacuum interconnected chemical vapor deposition apparatus

The utility model discloses a kind of vacuum interconnection chemical vapor deposition devices, including vacuum pipeline A, ordinary pipeline B and ordinary pipeline C, the vacuum pipeline A, ordinary pipeline B and ordinary pipeline C are arranged in parallel, and vacuum pipeline A, ordinary pipeline B and ordinary pipeline C are all provided with three-way joint, and every three-way joint on ordinary pipeline B is connected with one gas path summary device by one connecting pipeline E, another inlet on gas path summary device is communicated with ordinary pipeline C by connecting pipeline F, every gas path summary device is connected with one vapor deposition equipment by pipeline, the outlet of vapor deposition equipment is connected with the three-way joint on vacuum pipeline A by connecting pipeline D, one of which vapor deposition equipment is provided with vacuum pump, the device can improve experimental efficiency, save experimental space and reduce the effect of cost, while guarantee the quality of growth film material.
Owner:INST OF PHYSICS HENAN ACAD OF SCI +1