Optical element X, Y and theta Z three-freedom-degree jogging regulation device
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
- Publication Date
- 2012-10-03
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] Optical elements X, Y, θ Z A three-degree-of-freedom micro-adjustment device belongs to the field of structure design and aberration compensation of photolithography objective lenses, and is especially suitable for micro-adjustment of optical lenses in deep ultraviolet projection objectives. Background technique
[0002] Projection lithography equipment is the key equipment in the manufacturing process of large-scale integrated circuits. In recent years, with the continuous improvement of the fineness of the line width of integrated circuits, the resolution of projection optical equipment has gradually improved. At present, the ArF excimer laser with a wavelength of 193.368nm Lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes.
[0003] During the installation, adjustment and use of the projection lithography objective lens, in order to meet the good optical performance of the obj...