Method for depositing multiple material layers on substrate and chemical vapor deposition equipment

Abstract

The invention discloses a method for depositing multiple material layers on a substrate and chemical vapor deposition equipment. A plurality of growth chambers are adopted, the deposited multiple material layers are distributed into the growth chambers, and at least two growth chambers are used for growing different material layers of the multiple material layers, therefore, on one hand, different growth chambers can meet the requirements of different material layers on growth conditions such as temperature and pressure intensity easily and normal growth of each material layer is promoted, and on the other hand, each growth chamber can control the reaction time well, the problem that one or more chambers are in the waiting state in the production process is avoided, and the production efficiency is greatly improved.

Description

technical field [0001] The invention relates to a method for depositing multi-layer material layers, and chemical vapor deposition (CVD) equipment applicable to the method, in particular to an organic metal chemical vapor deposition (MOCVD) equipment. Background technique [0002] At present, light emitting diodes (Light Emitting Diodes, LEDs) are widely used due to their various advantages. However, what follows is that the performance requirements of LEDs in the industry are becoming more and more stringent, and the manufacture of LEDs is a process that requires multiple depositions of material layers. Therefore, how to ensure that the material layers can play their due role after deposition, It will have a significant impact on the improvement of LED performance. [0003] In the prior art, the deposition of various material layers is carried out in one growth chamber, for example, in the same growth chamber of metal organic compound chemical vapor deposition (MOCVD) equi...

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