An analysis power supply, mineral powder analysis device and method
A power supply and mineral powder technology, applied in the field of mineral powder analysis device and ion analysis power supply, can solve the problems of large volume, poor reliability and safety, long reverse recovery time, etc., and achieve a high degree of intelligence and a wide controllable range. , the effect of fast response
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Embodiment 1
[0054] An analytical power supply comprising:
[0055] a power supply that provides current to the reluctance;
[0056] a reluctance having an output;
[0057] a reluctance drive that controls the inductance of the reluctance;
[0058] A pulse generator, the pulse generator has an output end to output high-voltage pulses, and together with the output end of the magnetoresistance as the total output end of the high-power plasma analysis power supply;
[0059] A control unit, the control unit controls the operation of the power supply, reluctance drive and pulse generator.
[0060] The power supply can output a large current to provide arc energy to subsequent devices.
[0061] Preferably, the power supply is a plasma power supply.
[0062] Preferably, the power supply is a digital power supply.
[0063] The digital power supply can output multiple pulses according to a certain combination frequency. As long as there is a pulse output, the power output is high. When there i...
Embodiment 2
[0093] This embodiment is an application example of Embodiment 1.
[0094] This embodiment provides an analysis power supply, which is applied to mineral powder analysis.
[0095] see figure 1 , a high-power plasma analysis power supply, including:
[0096] A power supply 1, the power supply 1 is a plasma analysis power supply, and the power supply 1 is connected to the reluctance 2 and the control unit 3;
[0097] A reluctance 2 and a reluctance drive 4, the reluctance drive 4 is connected to the reluctance 2 and the control unit 3;
[0098] A pulse generator 5, the pulse generator 5 is connected to the control unit 3, the output end of the pulse generator 5 and the output end of the reluctance 2 are simultaneously used as the total output end 10 of the high-power plasma analysis power supply;
[0099] A control unit 3, the control unit 3 controls the power supply 1 to supply current to the reluctance 2, controls the drive of the reluctance to control the inductance of the...
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