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CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extraction method

A watermark embedding and watermark extraction technology, applied in image data processing, image data processing, instruments, etc., can solve the problems that are not conducive to improving image quality, and do not have data distribution extending in the opposite direction

Active Publication Date: 2019-02-12
HUNAN UNIV
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  • Application Information

AI Technical Summary

Problems solved by technology

The difference between the amount of data on the left and right sides of the peak is zero, and it does not have the characteristics that the data distribution extends in the opposite direction, which is not conducive to improving image quality

Method used

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  • CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extraction method
  • CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extraction method
  • CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extraction method

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Experimental program
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Embodiment Construction

[0101] The inventive method specifically comprises:

[0102] Step1: Construct an asymmetric histogram

[0103] First, calculate the prediction difference according to formulas (1), (2) and (3) of the data sequence to be processed:

[0104] When i=1, its forecast difference can be calculated as:

[0105] ec i1 =ec i2 =x i . (1)

[0106] When i=2, its forecast difference can be calculated as:

[0107]

[0108] When i>=3, its prediction difference can be calculated as:

[0109]

[0110] Select the larger ec of the forecast difference i (max)=max(ec i1 ,ec i2 ) to construct the maximum prediction difference histogram EC(max)=ec 1 (max),...ec m (max) is shown in Figure 3(a), which is different from the general forecast error histogram that obeys the Laplace-like distribution. The present invention selects the larger one of the two forecast differences as the element to construct the histogram, and most of the difference The value data is concentrated on the right ...

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Abstract

The invention discloses a CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extracting method. According to the CAD engineering drawing reversible watermarking method, watermark embedding method and watermark extracting method, a plurality of prediction difference values are calculated by using correlations between adjacent coordinates and between adjacent phases; proper difference values are selected through an asymmetric mode to construct an asymmetric histogram; and dual-complementary watermarking embedding can be realized through adopting a scheme according to which the histogram is modified in an opposite direction. As indicated by experimental results and analysis, the methods have strict reversibility and can be applied to the content authentication and secure communication of 2D CAD engineering drawings.

Description

technical field [0001] The invention relates to the technical field of digital watermarking, in particular to a reversible watermarking method for CAD engineering drawings, a watermark embedding method and a watermark extraction method. Background technique [0002] In recent years, research on reversible watermarking based on histogram translation and reversible watermarking of two-dimensional engineering drawings has achieved certain results, mainly as follows: [0003] (1) Reversible watermarking method based on histogram translation [0004] The reversible watermarking algorithm based on histogram shift has received extensive attention since it was proposed. Subsequently, G. Xuan and X. Wu successively proposed histogram translation algorithm based on integer wavelet transform, and obtained higher embedding capacity and watermark image quality. The researcher also presents a histogram shift technique based on the prediction difference, which further improves the perfor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06T1/00
Inventor 彭飞龙琴
Owner HUNAN UNIV
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