Mask comprising monitored patterns, and monitoring method
A mask plate and graphics technology, applied to the photoplate making process of the pattern surface, the original for photomechanical processing, optics, etc., can solve the problems of misjudgment of mask plate quality and low yield rate of semiconductor products, and achieve Avoid the loss of product yield and improve the effect of reliability
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[0035] It can be known from the background art that in the prior art, after the geometrical figure defining the design pattern is formed on the mask plate, the subsequent process of semiconductor manufacturing is performed with the mask plate, which easily brings loss to the product yield.
[0036]After the design graphics are defined in the mask, the monitoring method for the mask is usually to monitor the top view of the mask (mask top view). Specifically, first obtain the top view of the mask with the design graphics defined SEM (Scan Electron Microscope) diagram of the view. When there is no problem with the information displayed in the top view, it is determined that the manufactured mask meets the requirements, and the design pattern in the mask is determined to be free of defects, so the manufactured mask can be put into the subsequent semiconductor process flow.
[0037] After analysis, it was found that in mask manufacturing, even if the information displayed in the a...
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