Mask comprising monitored patterns, and monitoring method

A mask plate and graphics technology, applied to the photoplate making process of the pattern surface, the original for photomechanical processing, optics, etc., can solve the problems of misjudgment of mask plate quality and low yield rate of semiconductor products, and achieve Avoid the loss of product yield and improve the effect of reliability
CN107045259AActive Publication Date: 2017-08-15SEMICON MFG INT (SHANGHAI) CORP +1
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
SEMICON MFG INT (SHANGHAI) CORP
Publication Date
2017-08-15

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Abstract

The invention discloses a mask comprising monitored patterns, and a monitoring method. The mask comprises designed patterns and the monitored patterns, wherein the monitored patterns comprise a first pattern, and a plurality of separated second patterns positioned on the two sides of the first pattern; the extension direction of the first pattern is parallel to the arrangement direction of the second patterns positioned on the same side of the first pattern; the first pattern and the second patterns positioned on one side of the first pattern have first key feature dimensions; the first pattern and the second patterns positioned on the other side of the first pattern have second key feature dimensions; and the first key feature dimensions and the second key feature dimensions are the same from top view. The mask in fault can be found effectively in time; the profile appearance and quality of the designed patterns of the mask can be judged; the pattern quality judging reliability of the mask can be improved; and the yield of a semiconductor product can be improved.
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Description

technical field

[0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a mask plate containing monitoring patterns and a monitoring method. Background technique

[0002] In the field of integrated circuit manufacturing, photolithography is used to transfer patterns from a photolithographic mask containing circuit design information to a wafer (wafer). The photolithographic mask, also known as photolithography A plate, a mask plate or a photomask is a flat plate with light transmission to the exposure light, and has at least one geometric figure with light shielding on the exposure light, which can selectively block the photoresist on the surface of the wafer The light on the wafer finally forms a corresponding pattern on the photoresist on the surface of the wafer.

[0003] In semiconductor manufacturing, how to ensure that the geometric figures defining the design graphics are accurately formed on the mask plate is one of the k...

Claims

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