A light water reactor zirconium tube coating
A technology of light water reactor and zirconium tube, applied in coating, metal material coating process, vacuum evaporation coating and other directions, can solve the problem of no reliable and effective technical process method and route, etc., to improve and ensure high quality, improve Effect of surface strength, high peel strength
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Embodiment 1
[0055] 1. Turn on the high-power pulse magnetron deposition system to clean the surface of the zirconium tube with metal ions. During cleaning, the total beam current is 2-6A, the negative pressure is 500-1000V, the high-power pulse power is 30KW, the temperature is 300-550°C, and the air pressure is 1× 10 -1 -1Pa, the incoming gas is Ar, and the bombardment time is 30-120min.
[0056] 2. Turn on the magnetic filtration technology and high-power pulse magnetron deposition technology to deposit the metal film layer on the surface of the zirconium tube. -3 -1×10 -1 Pa, the rotation mode is revolution + rotation, and the revolution speed is 10r / min; the cathode target material of magnetic filtration technology is CrAlSi, the arcing current is 80A, and the beam current is 800mA; the cathode target material of high-power pulse technology is MoNbZr, pulse power 30KW, pulse The width is 0-30ms, the beam intensity is 0-3A; the zirconium tube coating is an alternating nano-cycle comp...
Embodiment 2
[0058] 1. Turn on the high-power pulse magnetron deposition system to clean the surface of the zirconium tube with metal ions. During cleaning, the total beam current is 2-6A, the negative pressure is 500-1000V, the high-power pulse power is 100KW, the temperature is 300-550°C, and the air pressure is 1× 10 -1 -1Pa, the incoming gas is Ar, and the bombardment time is 30-120min.
[0059] 2. Turn on the magnetic filtration technology and high-power pulse magnetron deposition technology to deposit the metal film layer on the surface of the zirconium tube. -3 -1×10 -1 Pa, the rotation mode is revolution + rotation, and the revolution speed is 10r / min; the cathode target material of magnetic filtration technology is CrAlSi, the arcing current is 75A, and the beam current is 750mA; the cathode target material of high-power pulse technology is MoNbZr, pulse power 100KW, pulse The width is 0-30ms, the beam intensity is 0-3A; the zirconium tube coating is an alternating nano-cycle co...
Embodiment 3
[0061] 1. Turn on the high-power pulse magnetron deposition system to clean the surface of the zirconium tube with metal ions. During cleaning, the total beam current is 2-6A, the negative pressure is 500-1000V, the high-power pulse power is 300KW, the temperature is 300-550°C, and the air pressure is 1× 10 -1 -1Pa, the incoming gas is Ar, and the bombardment time is 30-120min.
[0062] 2. Turn on the magnetic filtration technology and high-power pulse magnetron deposition technology to deposit the metal film layer on the surface of the zirconium tube. -3 -1×10 -1 Pa, the rotation method is revolution + rotation, and the revolution speed is 10r / min; the cathode target material of the magnetic filter technology is CrAlSi, the arcing current is 70A, and the beam current is 700mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 300KW, the pulse The width is 0-30ms, the beam intensity is 0-3A; the zirconium tube coating is an alternat...
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