mask

A mask, rectangular area technology, applied in the field of masks, can solve the problems of unfavorable mask sag, increasing the complexity of fine metal mask opening, and the need for further research on mask.
CN111394692BActive Publication Date: 2022-05-13BOE TECH GRP CO LTD +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BOE TECH GRP CO LTD
Publication Date
2022-05-13

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Abstract

The present invention provides a mask. The mask plate includes: a rectangular area; two jaw areas, the two jaw areas are respectively located on two opposite sides of the rectangular area, and the jaw areas have first sides and The third side, the second side and the fourth side, the first side is located on the side of the rectangular area, and the minimum horizontal distance between the second side and the fourth side is smaller than the side length of the first side. Therefore, when the mask is stretched, the flatness and sag of the mask can be effectively improved; and compared with the mask of the existing structure, the number of jaw areas of the mask of the present application Less, it can reduce the complexity of stretching and simplify the simulation; at the same time, it can break through the limit on the size of the mask and design a mask with a larger size.
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Description

technical field

[0001] The invention relates to the field of mask plate technology. Background technique

[0002] In recent years, as a new generation of display technology, organic light-emitting diodes (OLEDs) have been widely sought after and recognized by the market for their advantages such as self-luminescence, fast response, wide temperature range, and flexible display. With the advent of the 5G era, high-quality, wide and foldable mobile phone screens are hot. At the same time, the market share of OLED screens in medium and large sizes is also increasing, which poses a challenge to the fine metal mask (Fine Mental Mask, FMM) stretching equipment in the existing evaporation process. Currently commonly used fine metal masks such as figure 1 (the mask plate 100 includes a rectangular area 20 and a jaw area 10, wherein the rectangular area 20 includes a display area 21 and a fixed area 22). warping, which is not conducive to the improvement of the sag of the AA area (...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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