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Migration modeling and debugging method of dielectric filter based on mechanism-guided data acquisition

A dielectric filter and data acquisition technology, which is applied to waveguide devices, electrical components, frequency measurement devices, etc., can solve problems such as inability to model debugging, reduce debugging efficiency, and different mapping relationships, so as to improve debugging efficiency and improve efficiency , the effect of narrowing the range

Active Publication Date: 2022-03-11
CHINA UNIV OF GEOSCIENCES (WUHAN)
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Problems solved by technology

[0004] In the debugging of dielectric filters with the same structure and different batches, due to the different mapping relationship between structural parameters and scattering parameters, the model obtained from the same batch of data cannot be used for debugging
Collecting a large amount of data on each batch of dielectric filters to retrain the model will reduce debugging efficiency

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  • Migration modeling and debugging method of dielectric filter based on mechanism-guided data acquisition
  • Migration modeling and debugging method of dielectric filter based on mechanism-guided data acquisition
  • Migration modeling and debugging method of dielectric filter based on mechanism-guided data acquisition

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Embodiment Construction

[0036] In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific implementation manners of the present invention will now be described in detail with reference to the accompanying drawings.

[0037] The embodiment of the present invention provides a dielectric filter migration modeling and debugging method based on mechanism guidance data collection, which is used to establish a debugging decision model suitable for different batches of dielectric filters, and realizes from the depth of the resonant hole of the dielectric filter to the reflection The mapping of the scattering parameters (S parameters) of the filtering performance is mainly divided into five steps, such as figure 1 shown.

[0038] In the fitting analytical formula part, according to the correlation between the depth of the resonant hole, the dielectric constant and the center frequency, the depth of all the resonant holes h = [h 1 ,h 2 ,......

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Abstract

The invention provides a dielectric filter migration modeling and debugging method based on mechanism-guided data collection. According to the correlation between the depth of the resonance hole, the dielectric constant and the center frequency, the depth of the resonance hole, the center frequency, and the dielectric constant are obtained by fitting. Analytical formula of constant and center frequency; calculate the data acquisition range of the first batch of dielectric filters; establish a debugging decision model suitable for the first batch of dielectric filters, used to debug the first batch of dielectric filters; calculate other Data acquisition range of any batch of dielectric filters; establishment of a debugging decision model applicable to any other batch of dielectric filters, used to debug any other batch of dielectric filters. The beneficial effects of the present invention are: the method reduces the scope of data collection, improves the efficiency of data collection, makes the modeling method for dielectric filters with strong individual differences more flexible, and further improves the debugging efficiency of dielectric filters , has practicality and applicability.

Description

technical field [0001] The invention relates to the field of microwave filters, in particular to a method for modeling and debugging dielectric filter migration based on mechanism-guided data collection. Background technique [0002] The dielectric filter is a microwave filter made of ceramic materials. With the advantages of small size and low loss, it has become the mainstream frequency selection device for 5G base stations. Affected by the poor consistency of the dielectric constant of different batches of ceramic materials, the scattering parameters (reflecting the filtering performance) of the same structure and different batches of dielectric filters will be different, and the mapping relationship between the structural parameters and the scattering parameters is also different. . [0003] In the production process of dielectric filters, due to the existence of design errors, processing tolerances and differences in the characteristics of ceramic materials, the proces...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01P1/20H01P11/00G01R23/02
CPCH01P1/2002H01P11/007G01R23/02
Inventor 曹卫华郭琳炜毕乐宇袁艳
Owner CHINA UNIV OF GEOSCIENCES (WUHAN)