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Uniform magnetic field generating equipment and magnetic field generating unit thereof

A technology for generating a unitary, uniform magnetic field, applied in the direction of magnets, electrical components, magnetic objects, etc., can solve the problem of difficult to provide a uniform and parallel magnetic field to the surface of the target

Inactive Publication Date: 2012-05-23
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the above problems, the object of the present invention is to provide a magnetic field generating device and its magnetic field generating unit to solve the problem in the background art that it is difficult to provide a uniform and parallel magnetic field to the surface of the target

Method used

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  • Uniform magnetic field generating equipment and magnetic field generating unit thereof
  • Uniform magnetic field generating equipment and magnetic field generating unit thereof
  • Uniform magnetic field generating equipment and magnetic field generating unit thereof

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Embodiment Construction

[0065] Please refer to Figure 1A and Figure 1B , Figure 1A It is a schematic structural diagram of a uniform magnetic field generating device according to an embodiment of the present invention, Figure 1B based on Figure 1A A plan view of the uniform magnetic field generating device. The uniform magnetic field generating device of the present invention includes an adsorption plate 100 and a magnetic field generating unit 10 . The magnetic field generating unit 10 includes a first magnetic component 101 , a second magnetic component 102 and a third magnetic component 103 . The first magnetic component 101 , the second magnetic component 102 and the third magnetic component 103 are disposed on a plane 110 of the adsorption plate 100 . The first magnetic component 101 is a cylinder. In this embodiment, the first magnetic component 101 is, for example, a pentagonal cylinder. The second magnetic component 102 and the third magnetic component 103 are ring-shaped. In this e...

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Abstract

A magnetic field generating unit includes a first magnetic component, a second magnetic component, and a third magnetic component. The first magnetic component has a first magnetic pole, the second magnetic component surrounds the first magnetic component. The second magnetic component has a second magnetic pole facing the same direction as the first magnetic pole, and the first magnetic pole is opposite to the second magnetic pole. The third magnetic component surrounds the first magnetic component, and the third magnetic component is located between the first magnetic component and the second magnetic component. The third magnetic component has a third magnetic pole and a fourth magnetic pole, and the third magnetic pole is opposite to the fourth magnetic pole. The third magnetic pole faces the first magnetic component and the fourth magnetic pole faces the second magnetic component. The arrangement manner of the magnetic components may generate a uniform planar magnetic field.

Description

technical field [0001] The invention relates to a magnetic field generating device and a magnetic field generating unit thereof, in particular to a uniform magnetic field generating device capable of generating a uniform plane magnetic field and a magnetic field generating unit thereof. Background technique [0002] The application of magnetic fields is very extensive. For example, fields such as optoelectronic semiconductor equipment, motor components, superconducting research, and maglev technology all have requirements and configurations for magnetic fields. For example, magnetron sputtering technology requires a magnetic field distribution parallel to the surface of the target to increase the utilization rate of the target. The magnetron plasma assisted chemical vapor deposition technology requires a large area of ​​magnetic field distribution parallel to the substrate to increase the deposition rate and film uniformity. As for the electron cyclotron resonance planar co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01F7/00C23C14/35
CPCH01F7/0278C23C14/35
Inventor 李侃峰林冠宇
Owner IND TECH RES INST