A model device used to study the migration of polluted gases when pile foundations are laid in polluted sites
A technology of polluted gas and model device, which is applied in the fields of environmental engineering, civil engineering, and environmental geotechnical engineering, can solve the problems of few researches, and achieve the effect of improving the uniformity of distribution and the accuracy.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0022] The technical solutions of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.
[0023] Such as figure 1 with figure 2 As shown, a model device for studying the migration of polluted gas when pile foundations are laid in the embodiment of the present invention includes a model box 1 and a polluted gas release device 4; wherein, the inner bottom of the model box 1 is provided with a gas Dispersion pipe 16, the model box 1 is filled with soil layer 2, fine sand layer 12 and gravel layer 11 sequentially from top to bottom, and the top surface of the soil layer 2 is provided with a horizontal isolation layer 3 for polluted gas; the model box 1 The upper part is provided with a gas collection chamber 10; the gas collection chamber 10 is located above the pollution gas horizontal isolation layer 3, and the gas collection chamber 10 includes gas collection sub-chambers 101 arranged in parallel with each other...
PUM
Property | Measurement | Unit |
---|---|---|
length | aaaaa | aaaaa |
height | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com