Negative photoresist and application thereof

A technology of negative photoresist and modified resin, which is applied in optics, photomechanical equipment, photosensitive material processing, etc., can solve the problems of limited improvement, side effects, high addition amount, etc., and achieve the effect of high flexibility in use

Active Publication Date: 2019-02-15
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The general way to improve the adhesion is to use additives. This method has limited improvement and is prone to other side effects, such as high additives, and the risk of small molecular substances forming liters to contaminate the machine, etc.

Method used

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  • Negative photoresist and application thereof
  • Negative photoresist and application thereof
  • Negative photoresist and application thereof

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Embodiment Construction

[0024] The following description of the embodiments refers to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "top", "bottom", etc., are only for reference to the attached drawings. direction. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention.

[0025] In one embodiment, the negative photoresist of the present invention contains catechol groups. The components in the negative photoresist include 8%-9% of resin matrix; 1%-2% of modified resin; 5%-8% of dye; 5.8%-10.6% of monomer ; photoinitiator, 0.1%-0.2%; first additive, 0.1%-0.2%; solvent, 70%-80%; wherein, the modified resin contains the catechol group.

[0026] The resin matrix is ​​at least one selected from pure acrylic resin, epoxy acrylic resin, polyester acrylic r...

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Abstract

The invention discloses a negative photoresist and an application thereof. The negative photoresist contains catechol groups. The negative photoresist is coated and cured on the surface of a silicon substrate to form negative photoresistance, the surface of the silicon substrate has a hydroxyl structure, the negative photoresist has catechol groups, and a hydrogen bond structure is formed betweena hydroxyl structure in the catechol groups and the hydroxyl structure of the silicon substrate. According to the negative photoresist and the application thereof provided by the invention, compoundswith catechol groups are added into the negative photoresist, so that hydroxyl groups in the catechol groups and the hydroxyl groups in the silicon substrate form hydrogen bonds, and then the adhesionforce between the negative photoresistance formed by the negative photoresist and the silicon substrate is improved.

Description

technical field [0001] The invention relates to the fields of photoresist resin, liquid crystal display and the like, in particular to a negative photoresist and its application. Background technique [0002] Liquid crystal displays (LCDs) are the most widely used real-world products in the market today. As the core device of liquid crystal display, TFT-LCD mainly includes three components: color filter substrate, liquid crystal, and array substrate. The RGB color photoresists on the color filter substrate respectively correspond to the three sub-pixels on the array substrate, and the three sub-pixels are combined into one pixel. The color display of the liquid crystal display is mainly realized by RGB three-color pixels on the color filter substrate. The RGB three-color pixel dots are filmed by three different systems of RGB photoresists to form the pattern structure required by the design to assist in color development. [0003] COA (Color Filter Array) technology is a ...

Claims

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Application Information

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IPC IPC(8): G03F7/038G03F7/004G03F7/32
CPCG03F7/004G03F7/038G03F7/32
Inventor李颖
OwnerSHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD