Method and apparatus for diagnosing particle

A diagnostic method and technology for a diagnostic device, which are applied in measurement devices, particle and sedimentation analysis, particle size analysis, etc., can solve problems such as the decrease in the operation rate of the device and the inability to sufficiently reduce particles, and achieve the effect of reducing the generation of particles and efficient cleaning

Active Publication Date: 2019-03-05
NISSIN ION EQUIP CO LTD
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  • Claims
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Problems solved by technology

[0004] However, since the particle generation site exists not only in the ion source but also in the transport mechanism that transports the substrate, cleaning only a part of the apparatus as in Patent Document 1 cannot sufficiently reduce the generation of particles.
[0005] However, depending on the size of the device, it takes about a week, for example, to clean all parts that may be particle generation sites, which significantly reduces the operating rate of the device.

Method used

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  • Method and apparatus for diagnosing particle
  • Method and apparatus for diagnosing particle
  • Method and apparatus for diagnosing particle

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Embodiment Construction

[0041] One embodiment of the microparticle diagnosis method of the present invention will be described with reference to the drawings.

[0042] The microparticle diagnosis method of this embodiment is used, for example, to diagnose whether or not microparticles are generated and where the microparticles are generated in the plasma beam irradiation apparatus 100 of an ion implantation device and an ion doping device.

[0043] First, the ion beam irradiation apparatus 100 will be described.

[0044] Such as figure 1 As shown, the ion beam irradiation apparatus 100 transports the substrate W (hereinafter referred to as the target W) to the irradiation position of the ion beam IB and irradiates the ion beam IB, forming a transport line L1 for transporting the target W and an ion beam through which the ion beam IB passes. Line L2.

[0045] The transport line L1 is formed over a plurality of areas (rooms), from the load lock room R1 storing the target object W, the transport room ...

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Abstract

The invention provides a method and an apparatus for diagnosing a particle. For reducing generation of particles through high-efficiency cleaning, a particle generating part in an ion beam irradiatingdevice is diagnosed. The method for diagnosing the particle comprises the steps of a conveying and irradiating step (S1), conveying a first substrate to the irradiating position of an ion beam (IB) through a preset conveying line (L1), and irradiating the ion beam (IB) to the first substrate which is conveyed to the irradiating position; a first determining step (S2), determining the number of the particles adhered on the first substrate to which the ion beam (IB) is irradiated in the conveying and irradiating step (S1); a conveying step (S3), when many particles are determined in the first determining step (S2), conveying a second substrate to the irradiating position through a conveying line (L1); and a second determining step (S4), determining the number of the particles adhered on thesecond substrate which is conveyed to the irradiating position in the conveying step (S3).

Description

technical field [0001] The present invention relates to a particle diagnosis method and a particle diagnosis device for diagnosing a particle generation site in an ion beam irradiation device. Background technique [0002] For example, in an ion implantation apparatus and an ion doping apparatus, or plasma beam irradiation apparatus, particles are generated for various reasons, and when the amount of generated particles increases, various failures such as implantation defects may occur. [0003] Therefore, Patent Document 1 describes a cleaning method in which hydrogen plasma is generated in a plasma generation chamber constituting an ion source, and the deposits adhering to the wall surface of the plasma generation chamber are peeled off by utilizing its heat, sputtering, etc. . [0004] However, since the particle generation site exists not only in the ion source but also in the transport mechanism for transporting the substrate, cleaning only a part of the apparatus as i...

Claims

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Application Information

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IPC IPC(8): H01J37/244H01J37/317
CPCH01J37/244H01J37/3171G01N15/02G01N2015/0096G01N23/2255G01N2223/081
Inventor藤本龙吾
OwnerNISSIN ION EQUIP CO LTD