Electron emission device including enhanced beam focusing and method of fabrication
a technology of electron beam and electron beam, which is applied in the manufacture of electric discharge tubes/lamps, tubes with screens, discharge tubes luminescnet screens, etc., can solve the problems of difficult and complicated fabrication process, unintended color emission, and difficulty in completing the required fabrication process, so as to enhance the electron beam focusing effect and improve the structure of the focusing electrod
Inactive Publication Date: 2005-12-01
SAMSUNG SDI CO LTD
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Benefits of technology
The present invention provides an electron emission device and a method of manufacturing the same that improve the structure of the focusing electrode and insulating layer to enhance electron beam focusing effect. The device includes driving electrodes for controlling the emission of electrons from electron emission regions formed on a substrate, two or more insulating layers formed on the driving electrodes, and a focusing electrode formed on the insulating layers. The insulating layers have opening portions exposing the electron emission regions on the substrate, and the opening portions of the insulating layers are differentiated in size from each other. The method of manufacturing the electron emission device involves depositing insulating layers with different etching rates and using the focusing electrode as a mask layer to form an opening portion with a predetermined size. The technical effects of the invention include improved electron beam focusing and higher efficiency of electron emission.
Problems solved by technology
In an electron emission device with the above general structure, correcting the trajectory of electron beams to enhance the display characteristics has been a challenge.
As a result, the diffused electrons do not strike the intended phosphor layers; instead, they land on other-neighboring phosphor layers causing them to emit an unintended color.
Fabrication of electron emission devices using grid electrodes involves difficult and complicated processing steps.
Effective use of focusing electrodes may also lead to difficulty in the required fabrication process.
Forming holes with a high vertical to horizontal ratio involves fabrication processing difficulties.
Method used
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[0022] As shown in FIG. 1 and FIG. 2, one embodiment of the electron emission device of this invention 100 includes a first substrate 2 and a second substrate 4. The substrates 2, 4 are arranged in parallel while being apart from each other, leaving a space in between. The substrates 2, 4 are attached to each other by a spacer, to form a vacuum chamber outlining the device.
[0023] Cathode electrodes 6 may be formed with a stripe pattern on the first substrate 2 along one of the axes of the substrate. In FIG. 1, for example, the cathode electrodes 6 are formed in stripes along the y-axis of the drawing. A lower insulating layer 8 may be formed over the first substrate 2 covering the cathode electrodes 6. A number of gate electrodes 10 may be formed on the lower insulating layer 8. The gate electrodes 10 may be formed with a stripe pattern proceeding along a direction perpendicular to the direction of cathode electrodes 6. In FIG. 1, for example, the gate electrodes 10 are formed in s...
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An electron emission device adapted to enhanced electron beam focusing and its method of fabrication are shown. The device includes driving electrodes for controlling the emission of electrons from electron emission regions formed on a substrate; two or more tiers of insulating layers formed on the driving electrodes; and a focusing electrode formed over the tiers. A multi-tiered insulating layer allows a thick tier to hold the focusing electrodes away from the emission regions, thus enhancing their focusing impact, while a thin tier under the focusing electrodes remains amenable to intricate patterning. Fabrication of the tiers from material with different etching rates allows thicker lower support tiers to be etched during the same period and in the same step that a thinner upper tier is etched, also allowing openings in a lower tier to widen while openings in the upper tier stay small.
Description
CROSS-REFERENCE TO RELATED APPLICATION [0001] This application claims priority to and the benefit of Korean Patent Application No. 10-2004-0038238 filed on May 28, 2004in the Korean Intellectual Property Office, the entire content of which is incorporated herein by reference. BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to an electron emission device, and in particular, to an electron emission device and a method of manufacturing the same which enhances the structure of a focusing electrode for controlling the electron beams and an insulating layer for supporting the focusing electrode. [0004] 2. Description of Related Art [0005] Generally, electron emission devices are classified into a first type where a hot cathode is used as an electron emission source, and a second type where a cold cathode is used as the electron emission source. [0006] Cold cathode electron emission devices include, for example, field emitter array (FEA) de...
Claims
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IPC IPC(8): H01J31/12H01J1/304H01J1/62H01J9/02H01J29/02H01J29/06H01J63/04
CPCH01J1/304H01J29/06H01J29/028H01J9/025
InventorRYU, KYUNG-SUN
OwnerSAMSUNG SDI CO LTD