X-ray multilayer film structure aiming at response of multiple working energy points
An X-ray and multi-layer film technology, applied in the field of X-ray microscope structure for plasma diagnosis, can solve the problems of increasing subject cost and development cycle, spending a lot of time on installation and disassembly, etc., to reduce the ICF physical experiment cycle and increase the coating film. Difficulty, the effect of reducing complexity
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2015-04-29
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to an X-ray microscope structure for laser plasma diagnosis, in particular to an X-ray multi-layer film structure used in ICF physics experiments and responding to multiple working energy points. Background technique
[0002] X-ray backlight imaging is an important diagnostic tool for high energy density physics (HEDP) and inertial confinement fusion (ICF) research. The Kirkpatrick-Baez (KB) microscopic imaging system is the key equipment for high-temperature and high-density plasma diagnosis in inertial confinement fusion (ICF) research, and has been widely used in foreign OMEGA and LMJ devices. The imaging quality of the KB system based on the principle of grazing incidence reflective imaging varies significantly with the grazing incidence angle. The larger the grazing incidence angle, the higher the spatial resolution, but the selection of the grazing incidence angle should also take into account the limitation of the X-ray en...
Examples
Embodiment
[0029] An X-ray multilayer film structure responding to multiple working energy points, including a KB objective lens coated with multiple film systems responding to X-rays responding to different energy points. like figure 2 As shown, the upper surface of the KB objective lens substrate 1 is coated with the film system C3, and the film system A4 and the film system B5 are coated on the upper surface of the film system C3 at the same time, and the film system A4 and the film system B5 are arranged side by side. Film system A, film system B or film system C are all multilayer film systems, selected from periodic multilayer films, non-periodic multilayer films or transverse gradient multilayer films. In this embodiment, film system A is specifically a Cr / C periodic multilayer film with a thickness of 7.88nm, a thickness ratio of 0.4, and a period of 20, and film system B is specifically a W / C periodic multilayer film with a thickness of 3.9nm. The thickness ratio is 0.42, the ...