The utility model discloses a
surface cleaning device is used in organic
silicon release
film processing, including bottom plate, lower dust roller, upper dust roller and
ion fan, the upper side of bottom plate is provided with riser seat, the upper rotation is connected with five number conveyer roller in riser, one side of five number conveyer roller is provided with winding roller. The utility model discloses through the mutual cooperation of upper dust roller and lower dust roller and the purging effect of
ion fan, the complete cleaning of organic
silicon release film surface is jointly ensured, and this multilevel cleaning mode can effectively remove the dust, electrostatic and other impurities on the surface of material, reduce
impurity residue, improve the purity and
processing quality of product, and the
ion fan sends
ion wind to the upper air outlet and lower air outlet through the air duct, carries out all -round electrostatic
neutralization treatment to the organic
silicon release film, and this design can effectively remove the static charge on the surface of material, prevents the adsorption, adhesion and other problems caused by
static electricity, improves the stability of product and
controllability in
processing.