Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Primary material pack

An original ecology and facial mask technology, applied in cosmetics, skin care preparations, cosmetic preparations, etc., can solve the problems of human skin without nutrition and side effects, relieve skin hardening and keratinization, regulate oil secretion, and prevent facial wrinkles Effect

Inactive Publication Date: 2007-07-18
孙伟
View PDF0 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the ingredients of cosmetic skin care masks sold on the market generally contain mercury and lead. Although they can improve the skin of the face and other parts after use, they have certain side effects, and once they are not used continuously, the human skin still does not have continuous nutrition.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] The original ecological facial mask uses the essence extracted from spirulina, seaweed, kelp, aloe vera, and cactus as the main raw material of JG114A, which is provided by a company in West Germany.

[0015] The production method of the original ecological facial mask is: firstly take a certain amount of water and heat it to boiling, then add JG114A raw material, the amount of JG114A raw material is 1-5%, and at the same time add a small amount of titanium dioxide, the amount of titanium dioxide added is 0 / 08-0.12%, The above-mentioned raw materials are fully stirred, stirred evenly, and left to stand for 6-12 hours to form a paste, and bottled.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A plesiomorphic face mask with nutritive and health-care actions to skin is prepared from the raw material JG114A prepared from spirulina, seaweed, kelp, aloe and cactus, and water through boiling water, proportionally adding JG114A and TiO2, stirring, laying aside and bottling.

Description

technical field [0001] The invention relates to a pure natural skin care product original ecological facial mask. Background technique [0002] At present, the ingredients of cosmetic skin care masks sold on the market generally contain mercury and lead. Although they can improve the skin of the face and other parts after use, they have certain side effects. . Contents of the invention [0003] The purpose of the present invention is to provide a kind of original ecological facial mask that is made with the effective health nutrition essence of pure natural marine plant spirulina, seaweed, kelp and terrestrial plant aloe and cactus. [0004] To achieve the above object, the present invention is achieved through the following technical solutions: [0005] The original ecological facial mask is characterized in that: it is made of JG114A raw material extracted from spirulina, seaweed, kelp, aloe, and cactus as the main raw material, and is made by adding water; first, take...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/99A61K8/02A61Q19/00
Inventor 孙伟段德彰刘庆锋
Owner 孙伟
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com