Manufacturing method of array substrate, array substrate and display device
A technology of an array substrate and a manufacturing method, which are applied in the fields of array substrates and display devices, can solve the problems of restricting the application in the field of semiconductor display, high shut-off current, affecting the electrical characteristics of thin film transistors, etc., so as to improve display quality, improve electrical characteristics and reduce load. The effect of carrier concentration
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[0034] In order to improve the electrical characteristics of a thin film transistor in which ZnON is used as an active layer, embodiments of the present invention provide a method for fabricating an array substrate, the array substrate and a display device. In order to make the purpose, technical solution and advantages of the present invention clearer, the following examples are given to further describe the present invention in detail.
[0035] Such as figure 1 As shown, the method for fabricating an array substrate provided by the embodiment of the present invention includes fabricating a thin film transistor on a base substrate, and fabricating a thin film transistor on the base substrate includes the following steps:
[0036] Step 101, forming an active layer pattern comprising ZnON through a patterning process;
[0037] Step 102 , bombarding the active layer with oxygen-containing plasma.
[0038] The above-mentioned method can be used not only for manufacturing the ar...
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