A kind of cleaning agent for mask, its application and cleaning method of mask
A cleaning agent and mask technology, which is applied in the processing of photosensitive materials, etc., can solve the problems of danger, high cleaning temperature, and extremely high requirements for cleaning equipment materials, and achieves good degumming effect and environmental protection effect of cleaning agent.
Active Publication Date: 2019-05-14
SUZHOU CRYSTAL CLEAR CHEMICAL CO LTD
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Problems solved by technology
[0003] The Chinese patent with the application number 201310119808.7 provides a simple method for cleaning the mask. This invention uses concentrated sulfuric acid and hydrogen peroxide to clean. As we all know, the reaction between concentrated sulfuric acid and hydrogen peroxide is violent and very dangerous during the preparation process, and the latter stage is harmful to the material of the cleaning equipment. There are extremely high requirements; at the same time, the patent needs to be soaked for tens of minutes above 100°C, and the cleaning temperature is too high and the time is too long
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[0023] The problem to be solved by the present invention is to provide a stable and environmentally friendly cleaning agent with good cleaning effect. The comprehensive design of the formula of the cleaning agent is the key to solving this problem. Specifically, each component of the cleaning agent and the specific type selection and dosage of the components will have an impact on the performance and cost of the final cleaning agent.
[0024] In the present invention, the cleaning agent is composed of an inorganic base, a penetrating agent, a dispersing agent and water. An effective amount of inorganic alkali can break and disintegrate the molecular bonds of photoresist and acrylic glue; the amount of inorganic alkali should not be too high, otherwise it will corrode the mask, and if it is too low, it will not be cleaned. The penetrant can accelerate the penetration of the cleaning agent into the photoresist and acrylic layer, and accelerate the peeling off of the glue from th...
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The invention relates to a washing agent used for a mask and an application thereof and a washing method for the mask. The raw material formula of the washing agent comprises, by weight percentage, 1-30% of inorganic base, 0.1-10% of dispersing agent, 0.001-5% of penetrating agent and 55-98.899% of water. The washing agent can remove the photoresist and acrylic glue on the surface of the mask to be washed totally only in 3-5 min at room temperature, and the glue-removing effect is far better than that of the best level in the prior art. The washing agent system is alkaline medium, and compared with an acid system, the select range of material of washing equipment is wider. According to the washing agent used for the mask and the application thereof and the washing method for the mask, conventional organic polar or nonpolar solvent are not selected in the washing agent, the inorganic base, the dispersing agent and the penetrating agent are selected and designed and matched smartly, the glue-removing effect is excellent, and the COD value of the waste liquid is smaller than 200, so that the washing agent is more environmentally friendly.
Description
technical field [0001] The invention relates to a mask plate cleaning agent, its application and a mask plate cleaning method. Background technique [0002] Photomasks are used in chip manufacturing, mainly in IC chips, TFT-LCD, OLED and other electronic industries. The role played by the photomask is similar to that of a negative film to a photo. The pattern is exposed and developed on the chip through the mask plate multiple times to obtain the required photoresist pattern. The mask plate is dirty such as photoresist in multiple exposures and must be completely cleaned. [0003] The Chinese patent with the application number 201310119808.7 provides a simple method for cleaning the mask. This invention uses concentrated sulfuric acid and hydrogen peroxide to clean. As we all know, the reaction between concentrated sulfuric acid and hydrogen peroxide is violent and very dangerous during the preparation process, and the latter stage is harmful to the material of the cleaning...
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IPC IPC(8): G03F7/42
Inventor 高小云刘兵朱一华
Owner SUZHOU CRYSTAL CLEAR CHEMICAL CO LTD