Dynamic plasma generation device based on modulated radio frequency
A plasma and generating device technology, applied in the field of plasma, can solve the problems of difficult manual control of plasma, poor dynamic performance, etc., and achieve the effects of improving dynamics, speeding up exchange rate, and improving heat dissipation efficiency
Active Publication Date: 2020-07-17
XIDIAN UNIV
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Problems solved by technology
[0007] The purpose of the present invention is to overcome the existing defects of the above-mentioned prior art, and propose a dynamic plasma generation device based on modulated radio frequency, which is used to solve the difficulty of artificially controlling the plasma existing in the existing low-pressure unbalanced discharge plasma generation device. and technical problems of poor dynamic performance
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[0029] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.
[0030] refer to figure 1 , the present invention includes a plasma discharge cavity 1, an annular high-voltage electrode 2, a vacuum system 3, a cooling system 4, a plasma dynamic waveform generator 5, a modulated radio frequency power supply 6, a radio frequency matcher 7, a radio frequency shielding interface 8 and a first electromagnetic The experimental shielding chamber 9 and the second electromagnetic experimental shielding chamber 10 .
[0031]The plasma discharge cavity 1 includes a first wave transparent window 101 and a second wave transparent window 102 , an electrode interface 103 and an insulating and airtight block 11 . The plasma discharge cavity 1 adopts a cylindrical structure provided with a cylindrical cavity, and its two ends are respectively provided with a first wave-transmissive window 101 and a second wave-transparent ...
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The present invention proposes a dynamic plasma generating device based on modulated radio frequency, which is used to solve the technical problems of artificial control of plasma and poor dynamic performance of the existing low-pressure non-equilibrium discharge plasma generating device, including the plasma discharge cavity. , annular high-voltage electrode, vacuum system, cooling system, plasma dynamic waveform generator, modulated RF power supply, RF matching device, RF shielding interface and electromagnetic experiment shielding chamber; annular high-voltage electrodes are installed in the plasma discharge chamber, and electromagnetic experiments are fixed at both ends The shielding chamber is connected to the vacuum system. The cooling system is connected to the annular high-voltage electrode and the plasma discharge chamber. The plasma dynamic waveform generator generates waveform signals, modulates the RF power supply to multiply and amplify the waveform signals and the local oscillator signal, and matches the RF signal. The device and the radio frequency shielding interface connected with the plasma discharge chamber transmit the amplitude modulated wave signal to the annular high voltage electrode. The present invention can generate dynamic plasma with a certain frequency spectrum.
Description
technical field [0001] The invention belongs to the field of gas discharge plasma and relates to a plasma generating device, in particular to a dynamic plasma generating device based on modulated radio frequency, which can be used in the field of radio wave experiment testing. Background technique [0002] Studying the propagation characteristics of electromagnetic waves in plasma and the interaction between plasma and electromagnetic waves is the basis and key content of research work such as spacecraft re-entry, ionosphere research, and plasma stealth technology, among which ground experiments are to verify theoretical research and carry out The key link of the flight test is of great significance. Plasma is composed of a collection of ions, electrons, and unionized neutral particles. It is electrically neutral as a whole and exists widely in the universe. It is often regarded as the fourth state of matter. With the in-depth study of the problem, people realize that the d...
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IPC IPC(8): H05H1/46
CPCH05H1/46H05H1/4645
Inventor李小平雷凡刘彦明刘东林谢楷白博文
OwnerXIDIAN UNIV