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Air Knife Device for Drying Substrates

A technology of air knife and substrate, which is applied in the manufacture of electrical components, circuits, semiconductors/solid-state devices, etc.

Active Publication Date: 2021-01-01
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the above technical problems, an object of the present disclosure is to provide an air knife device for drying substrates, which can accurately detect changes in air volume at various positions of the air knife nozzle assembly by moving the telescopic flap and the moving sensor , timely discover the blockage problem of the air knife nozzle assembly, and prevent the abnormal quality of the substrate product due to the blockage of the air knife nozzle assembly

Method used

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  • Air Knife Device for Drying Substrates
  • Air Knife Device for Drying Substrates
  • Air Knife Device for Drying Substrates

Examples

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Embodiment Construction

[0020] In order to make the above and other objectives, features, and advantages of the present disclosure more comprehensible, preferred embodiments of the present disclosure will be exemplified below in detail with reference to the attached drawings. Furthermore, the direction terms mentioned in this disclosure, such as up, down, top, bottom, front, back, left, right, inside, outside, side layer, surrounding, center, horizontal, transverse, vertical, longitudinal, axial , radial direction, the uppermost layer or the lowermost layer, etc., are only directions for referring to the attached drawings. Therefore, the directional terms used are used to explain and understand the present disclosure, but not to limit the present disclosure.

[0021] In the figures, structurally similar units are denoted by the same reference numerals.

[0022] refer to figure 1 and figure 2 , figure 1 A schematic diagram showing the structure of an air knife device according to an embodiment of...

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Abstract

The invention provides an air knife device for drying a substrate. The air knife device comprises an air knife assembly, a movable telescopic baffle piece and a movable sensor. The air knife assemblycomprises an air knife air nozzle assembly, a pipeline connected with the air knife air nozzle assembly, an air supply device connected with the pipeline, and an adjusting device for controlling the wind power intensity of the air knife air nozzle assembly. The air knife air nozzle assembly comprises a first air knife air nozzle and a second air knife air nozzle, wherein the first air knife air nozzle and the second air knife air nozzle are used for blowing the two surfaces of the substrate respectively. The movable telescopic baffle piece is movably and telescopically arranged at the air outlet of the air knife air nozzle assembly. The movable sensor is movably arranged on the movable telescopic baffle piece, so as to detect the air outlet quantity of the air knife air nozzle assembly ata specific position. By virtue of the movable telescopic baffle piece and the movable sensor, the air volume changes of all positions of the air knife air nozzle assembly can be accurately detected, and the blockage problem of the air knife air nozzle assembly can be found in time, so that the phenomenon that the quality of the substrate product is abnormal due to blockage of the air knife air nozzle assembly is avoided.

Description

【Technical field】 [0001] The disclosure relates to an air knife device, in particular to an air knife device for a wet cleaning machine for drying substrates. 【Background technique】 [0002] In the process of manufacturing thin film transistor substrates, it is necessary to use various wet cleaning machines for cleaning, etching, developing and other processes. The process flow of these wet cleaning machines often has different cleaning processes depending on the process. The general cleaning process includes, for example, extreme ultraviolet (EUV) dry cleaning, chemical wet cleaning, brush cleaning, two-fluid water cleaning, Air knife drying etc. After the substrate is cleaned with liquid medicine and water, a large amount of water usually remains on the surface of the substrate. Before entering the next process, it needs to be dried by an air knife device to remove the water on the surface of the substrate, so as to avoid water remaining on the surface of the substrate an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67034
Inventor 刘思洋
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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