Sewing machine and double-layered cloth aligning device thereof

A cloth, double-layer technology, applied in the direction of sewing machine components, sewing equipment, cloth feeding mechanism, etc., can solve the problem of no double-layer cloth adjustment mechanism

Active Publication Date: 2019-04-09
JACK SEWING MASCH CO LTD
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no relevant double-lay

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sewing machine and double-layered cloth aligning device thereof
  • Sewing machine and double-layered cloth aligning device thereof
  • Sewing machine and double-layered cloth aligning device thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0038] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0039] A double-layer fabric alignment device provided by the present invention mainly includes a feed assembly and a friction assembly, as shown in the attached figure 1 And attached figure 2 As shown, the feed a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a double-layered cloth aligning device. The double-layered cloth aligning device comprises a feeding assembly and a friction assembly, wherein the feeding assembly is used forimplementing synchronous motion of an upper layer of cloth and a lower layer of cloth relative to a working table; the feeding assembly can rotate relative to the working table; and the friction assembly is positioned below the feeding assembly, and is used for providing friction force for the lower layer of cloth so that the lower layer of cloth and the upper layer of cloth can move relatively and then are aligned to each other. The invention further discloses a sewing machine which comprises the double-layered cloth aligning device. By the double-layered cloth aligning device, the double layers of cloths can be aligned.

Description

technical field [0001] The invention relates to the technical field of sewing machines, in particular to a sewing machine and a double-layer fabric alignment device thereof. Background technique [0002] At present, for different types of clothing, there are often many spliced ​​fabrics. After the splicing is completed, topstitches are sewn. In this way, after sewing, it can be flat and beautiful when used, such as topstitches such as collars, sleeves, and sleeves. sewing. [0003] However, due to the problems of operator efficiency and operation in the process of sewing and pressing, unlined lower end cloth always tends to occur. For the operation of ordinary workers, in the process of sewing topstitching, they usually rub the cloth with their fingers while sewing, and rub the lower layer of cloth under the upper layer of lining cloth to make it meet the process requirements. However, if the automatic machine equipment is used to move the cloth, the alignment of one side ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): D05B35/02
CPCD05B35/02
Inventor 宣海枫曾贤根吴建富
Owner JACK SEWING MASCH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap