Method of making X-ray combination lenses

Abstract

A method for manufacturing an X-ray composite lens, comprising the following steps: (A) growing an electroformed cathode film (2) on a conventionally cleaned substrate (1); (B) growing an electroformed cathode film (2) ) at a low speed to coat the first layer of AZP4903 positive photoresist, and bake and cure, the baking temperature is 97.5°C to 102.5°C, and the baking time is 8 to 12 minutes; Coat the second layer of AZP4903 positive photoresist on the positive photoresist at a low speed, and bake and cure. The baking temperature is 87.5°C to 92.5°C, and the baking time is 18 to 22 minutes; The resist is subjected to photolithography; (E) the sample after photolithography is baked first, and then developed; (F) the cleaned sample is electroformed; (G) the sample is taken out and cleaned with deionized water; (H) the sample Removing the remaining photoresist; (1) etching away the exposed electroformed cathode film (2), and then making it into a metal X-ray composite lens. The invention provides a method for manufacturing an X-ray combined lens with high yield, simple manufacturing process and good safety.

Description

(1) Technical field

[0001] The invention relates to an X-ray microstructure optical device, in particular to a manufacturing process of an X-ray combined lens, which is suitable for the occasion of making the X-ray combined lens. (2) Background technology

[0002] Creating an X-ray lens was long considered impossible because all materials refract too weakly and absorb too strongly at X-ray wavelengths. In order to realize the focusing of X-ray beams, scientists have successively developed grazing incidence X-ray total reflection mirrors, transmission X-ray zone plates, multilayer films, crystal X-ray Bragg-Fresnel elements and X-ray catheter elements, etc. However, these components are difficult to use in the range of X-ray radiation energy higher than 5keV. In 1996, Snigirev reported an X-ray combination lens that can be used in the high-energy X-ray band. The combined lens has many advantages, such as no need to bend the optical path, good high temperature stability and ...

Examples

Embodiment 1

[0022] refer to figure 1 , figure 2 , a method for making an X-ray composite lens, comprising the steps of: (A) growing a layer of electroformed cathode film (2) by sputtering or evaporation on a silicon or glass substrate (1) that has been conventionally cleaned, The film (2) is a copper material, where the copper material can be replaced by titanium or nickel or gold or titanium oxide material;

[0023] (B) Coating the first layer of AZP4903 positive photoresist on the electroformed cathode film (2) at a low speed, and baking and curing with a hot plate, the baking temperature is 97.5°C, and the baking time is 8 minutes;

[0024] (C) On the cured first layer of AZP4903 positive photoresist, coat the second layer of AZP4903 positive photoresist at a low speed, and bake and cure with a hot plate, the baking temperature is 90 ° C, and the baking time is 20 minutes;

[0025] (D) carry out photoetching to AZP4903 photoresist with ultraviolet lithography method, and its photoe...

Embodiment 2

[0032] In the technical solution of this embodiment, the electroformed cathode film (2) is titanium material in step (A); in step (B), the baking temperature is 102.5° C., and the baking time is 8 minutes, and the remaining steps are exactly the same as in Example 1. Same.

Embodiment 3

[0034] In the technical solution of this embodiment, the electroformed cathode film (2) is made of nickel material in step (A); in step (B), the baking temperature is 102.5° C., and the baking time is 12 minutes, and the remaining steps are completely the same as in Example 1. Same.

(1) Technical field

[0001] The invention relates to an X-ray microstructure optical device, in particular to a manufacturing process of an X-ray combined lens, which is suitable for the occasion of making the X-ray combined lens. (2) Background technology

[0002] Creating an X-ray lens was long considered impossible because all materials refract too weakly and absorb too strongly at X-ray wavelengths. In order to realize the focusing of X-ray beams, scientists have successively developed grazing incidence X-ray total reflection mirrors, transmission X-ray zone plates, multilayer films, crystal X-ray Bragg-Fresnel elements and X-ray catheter elements, etc. However, these components are difficult to use in the range of X-ray radiation energy higher than 5keV. In 1996, Snigirev reported an X-ray combination lens that can be used in the high-energy X-ray band. The combined lens has many advantages, such as no need to bend the optical path, good high temperature stability and ...

Examples

Embodiment 1

[0022] refer to figure 1 , figure 2 , a method for making an X-ray composite lens, comprising the steps of: (A) growing a layer of electroformed cathode film (2) by sputtering or evaporation on a silicon or glass substrate (1) that has been conventionally cleaned, The film (2) is a copper material, where the copper material can be replaced by titanium or nickel or gold or titanium oxide material;

[0023] (B) Coating the first layer of AZP4903 positive photoresist on the electroformed cathode film (2) at a low speed, and baking and curing with a hot plate, the baking temperature is 97.5°C, and the baking time is 8 minutes;

[0024] (C) On the cured first layer of AZP4903 positive photoresist, coat the second layer of AZP4903 positive photoresist at a low speed, and bake and cure with a hot plate, the baking temperature is 90 ° C, and the baking time is 20 minutes;

[0025] (D) carry out photoetching to AZP4903 photoresist with ultraviolet lithography method, and its photoe...

Embodiment 2

[0032] In the technical solution of this embodiment, the electroformed cathode film (2) is titanium material in step (A); in step (B), the baking temperature is 102.5° C., and the baking time is 8 minutes, and the remaining steps are exactly the same as in Example 1. Same.

Embodiment 3

[0034] In the technical solution of this embodiment, the electroformed cathode film (2) is made of nickel material in step (A); in step (B), the baking temperature is 102.5° C., and the baking time is 12 minutes, and the remaining steps are completely the same as in Example 1. Same.

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