Plasma processing apparatus
A technology for processing equipment and plasma, which is applied in the field of microelectronics, can solve problems such as low reliability, high technical difficulty, and difficulty in guaranteeing coating quality, and achieve reliable protection effects, reduce use costs, and avoid frequent disassembly and assembly.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0026] The core of the present invention is to provide a plasma processing device, which can simply and reliably prolong the life of the nozzle electrode, and further effectively reduce the use cost of the plasma processing device.
[0027] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0028] Please refer to image 3 and Figure 4 , image 3 It is a schematic diagram of the setting position of the liner provided by the present invention; Figure 4 It is a structural schematic diagram of a specific embodiment of the liner provided by the present invention.
[0029] In a specific embodiment, the plasma processing equipment provided by the present invention also includes a casing, in which there is a reaction chamber, and the top and bottom of the reaction chamber are respectively pro...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com