Thin film transistor, manufacturing method thereof, array substrate and display device
A technology of thin film transistors and conductorization, which is applied in the display field and can solve problems such as low product yield and conductorization
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[0023] Embodiments of the present invention are described in detail below. The embodiments described below are exemplary, only for explaining the present invention, and should not be construed as limiting the present invention. If no specific technique or condition is indicated in the examples, the technique or condition described in the literature in the field or the product specification is used. The reagents or instruments used without the manufacturer's indication are conventional products that can be obtained from the market.
[0024] The present invention is accomplished based on the following knowledge and findings of the inventors:
[0025] After extensive research, the inventor found that the existing top-gate thin film transistor (wherein, the specific structure of the active layer in the top-gate thin film transistor can refer to figure 1 ), when conducting the conducting treatment on the first conducting region 120 and the second conducting region 130, due to the...
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