Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

1results about How to "Avoid glare" patented technology

A back-contact solar cell and its Mark point preparation and positioning method

PendingCN122094233AEnsure clear imagingAvoid glareElectrical batterySolar cell
This invention discloses a back-contact solar cell and its mark point fabrication and positioning method, belonging to the field of solar cells. The back side of the silicon substrate of this solar cell has several pads arranged in an array, several fine grid lines connecting the pads, and at least one pair of edge mark points. The edge mark points are located near the side of the cell perpendicular to the extension direction of the interconnects. The vertical distance from the geometric center of the edge mark point to the aforementioned side is 1.0~4.0 mm. The edge mark point is located between two rows of pads adjacent to it. Two fine grid lines adjacent to the edge mark point are separated by the edge mark point, and the distance between the edge mark point and the separating edge of the fine grid line is greater than or equal to 20 μm. The above-mentioned edge mark point setting can achieve high-precision positioning and enable the interconnects and pads to form a more complete metallurgical bond, improving pull strength and yield.
Owner:TIANJIN ZHONGHUAN SEMICON CO LTD