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30results about How to "Sufficient uniformity" patented technology

Tetrodotoxin positive quality control sample as well as preparation method and application thereof

The invention discloses a method for preparing a tetrodotoxin positive quality control sample. The method comprises the steps of selecting muscular tissues from fresh fugu rubripes, homogenizing, and measuring the content of tetrodotoxin in the muscular tissues to verify whether the muscular tissues contain the tetrodotoxin; if the muscular tissue is a positive sample, diluting the positive sample containing toxin with a negative sample and a dispersant, mixing uniformly, continuously measuring the content of the toxin in the sample, packaging the sample after the sample meets requirements, preserving at an appropriate temperature, and performing uniformity verification and stability analysis on the sample; if the muscular tissue is a negative sample, adding a tetrodotoxin standard solution into the negative samples, adding a dispersant, mixing uniformly, measuring the content of the tetrodotoxin in the sample, packaging the sample after the sample meets requirements, preserving at an appropriate temperature, and performing uniformity verification and stability analysis on the sample. The quality control sample is simple to operate, and has enough stability and uniformity and long preservation time, so that the quality control sample can be used for laboratory quality control.
Owner:INSPECTION & QUARANTINE TECH CENT SHANDONG ENTRY EXIT INSPECTION & QUARANTINE BUREAU

Lime slaking steam treatment device

ActiveCN104193193AGuaranteed uniformityEnsuring sufficient homogeneity of quicklimeUsing liquid separation agentSlurryGuide tube
The invention provides a lime slaking steam treatment device. According to the device, steam in a slaking tank can be smoothly discharged, so that the steam does not enter a lime discharging device, smooth discharging of the lime discharging device is ensured, the discharged steam is purified and discharged into an ambient environment, and environment friendliness is ensured. The lime slaking steam treatment device comprises a quick lime slaking tank, wherein a stirrer is arranged in the quick lime slaking tank; a feeding pipe, a water inlet pipe and a steam exhaust smoke pipe are respectively arranged on the quick lime slaking tank; and an outlet is formed in the bottom of the quick lime slaking tank and is communicated with a lime slurry storage tank. The lime slaking steam treatment device is characterized in that a lime guide tube structure which is closed up from top to bottom is formed in the middle of an inner cavity of the feeding pipe; an air supply hole is formed in an outer wall of the feeding pipe corresponding to the lime guide tube structure; an external air supply pipe is communicated with the air supply hole; the lime slaking steam treatment device further comprises a smoke washing tank which is of a closed structure; and the steam exhaust smoke pipe is communicated with the bottom of the smoke washing tank by virtue of an air delivery pipeline.
Owner:WUXI XUELANG ENVIRONMENTAL TECH CO LTD

Galvanizing technology good for uniformity of galvanizing layer thickness

InactiveCN104762580APrevent Galvanizing FailureSimple methodHot-dipping/immersion processesAluminiumHydrogen chloride
The invention discloses a galvanizing technology good for uniformity of galvanizing layer thickness, which is used for anticorrosion processing on the surface of a photovoltaic flat rack. The technology comprises the steps of cleaning, drying, galvanizing and cooling in order, and the cleaning comprise comprises the steps of degreasing, examining, pickling and washing in order, the degreasing step employs a water-based metal degreasing agent for removing oil on the surface of the photovoltaic flat rack, the pickling step is characterized in that when the temperature scope is between 30-35 DEG C, a pickle containing hydrogen chloride, hexamethylene tetramine and corrosion inhibitor are employed for washing the photovoltaic flat rack; the corrosion inhibitor contains a nitrogen compound-containing corrosion inhibitor and a sulfur compound-containing corrosion inhibitor; the galvanizing step is characterized in that zinc liquid is heated to 455-480 DEG C, the photovoltaic flat rack is placed in the zinc liquid for keeping for 1-1.5 minutes and then is taken out, and the zinc liquid contains aluminium. The galvanizing technology has simple process, and a galvanizing layer with better combination quality, thickness quality and uniformity quality can be conveniently obtained.
Owner:CHENGDU ZHENZHONG ELECTRIC

Selected area epitaxy one-dimensional electron gas gan-based hemt device and its preparation method

ActiveCN103400856BImprove high temperature and high pressure characteristicsImprove featuresSemiconductor/solid-state device manufacturingSemiconductor devicesUltra high speedSelective area epitaxy
The invention discloses a one-dimensional electronic gas GaN-based HEMT (High Electron Mobility Transistor) device adopting selective area epitaxy and a preparation method thereof, and mainly solves the problems of poor high temperature and high voltage characteristics, frequency characteristic and power characteristic of an existing one-dimensional electronic gas device. The device comprises a substrate, a buffering layer, a passivation layer and a protection layer from bottom to top; the buffering layer adopts GaN; the buffering layer is provided with barrier layer strips and masking layer strips, which are periodically arranged at intervals; both ends of each barrier layer strip respectively are a source electrode and a drain electrode; the passivation layer is positioned on the barrier layer strips and the masking layer strips; the passivation layer is provided with a grid slot; a grid electrode is arranged in the grid slot; and the barrier layer strips adopt AlGaN and the width of each barrier layer strip is in nanometer dimension so as to form one-dimensional electronic gas. Compared with Si-based and GaAs-based one-dimensional electronic gas devices, due to the adoption of a wide bandgap semiconductor GaN with the outstanding material characteristics, the one-dimensional electronic gas GaN-based HEMT device adopting selective area epitaxy has excellent high temperature and high voltage characteristics, frequency characteristic and power characteristic, and the ultrahigh speed and low power consumption one-dimensional electronic gas device can be made.
Owner:云南凝慧电子科技有限公司

A lime digestion steam treatment device

ActiveCN104193193BGuaranteed uniformityEnsuring sufficient homogeneity of quicklimeUsing liquid separation agentPulp and paper industrySlurry
The invention provides a lime slaking steam treatment device. According to the device, steam in a slaking tank can be smoothly discharged, so that the steam does not enter a lime discharging device, smooth discharging of the lime discharging device is ensured, the discharged steam is purified and discharged into an ambient environment, and environment friendliness is ensured. The lime slaking steam treatment device comprises a quick lime slaking tank, wherein a stirrer is arranged in the quick lime slaking tank; a feeding pipe, a water inlet pipe and a steam exhaust smoke pipe are respectively arranged on the quick lime slaking tank; and an outlet is formed in the bottom of the quick lime slaking tank and is communicated with a lime slurry storage tank. The lime slaking steam treatment device is characterized in that a lime guide tube structure which is closed up from top to bottom is formed in the middle of an inner cavity of the feeding pipe; an air supply hole is formed in an outer wall of the feeding pipe corresponding to the lime guide tube structure; an external air supply pipe is communicated with the air supply hole; the lime slaking steam treatment device further comprises a smoke washing tank which is of a closed structure; and the steam exhaust smoke pipe is communicated with the bottom of the smoke washing tank by virtue of an air delivery pipeline.
Owner:WUXI XUELANG ENVIRONMENTAL TECH CO LTD

Chemical production reaction kettle

The invention discloses a chemical production reaction kettle, which comprises a casing, wherein foot margins are fixedly arranged at the two sides of the bottom end of the casing; a first motor is arranged in the center of the top of the casing; a feeding pipe and an air compression valve are respectively arranged at the top of the casing and positioned at the left side and the right side of the first motor; the bottom of the feeding pipe penetrates through the casing and extends into the casing; the top of the feeding pipe is connected with a feeding opening; a valve is arranged on the air compression valve; the bottom of the first motor is connected with a fixed shaft arranged inside the casing; the bottom of the fixed shaft is connected with a first rotating shaft arranged under the fixed shaft through the shaft coupler; a reaction cylinder is arranged in the center position inside the casing; the first rotating shaft penetrates through the reaction cylinder to extend into the reaction cylinder; a rotor arranged inside the reaction cylinder is fixedly arranged on the bottom of the first rotating shaft; a second motor is connected with the center of the bottom of the casing. The chemical production reaction kettle has the beneficial effects that the structure is simple; the operation is convenient; the reaction is sufficient; after the reaction, the media diameter is smaller; the effect is good; the work efficiency is high.
Owner:合肥速锐知识产权代理有限公司
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