The photo mask inspection machine and inspection method thereof

A technology for inspecting machines and reticles, applied to the original parts for opto-mechanical processing, optics, optical testing for flaws/defects, etc. The effect of clamping reliability

Active Publication Date: 2017-01-18
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in actual production, there are many different specifications of the photomask. When the size of the photomask is slightly reduced, the gap between the two pairs of jaws used to clamp the photomask and the photomask in the original photomask inspection machine increases. However, the grippers of the original photomask inspection machine cannot be well applied to the new photomask inspection. The gripping effect of the grippers is not good, and it is easy to cause the photomask to slip during the flipping process, causing the photomask to be damaged and scrapped

Method used

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  • The photo mask inspection machine and inspection method thereof
  • The photo mask inspection machine and inspection method thereof
  • The photo mask inspection machine and inspection method thereof

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Embodiment Construction

[0035] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0036] refer to figure 1 , the photomask inspection machine of the present invention includes: a carrying mechanism 10, a carrying mechanism 20 and a rotating mechanism 30, wherein the carrying mechanism 10 includes a carrying frame 11 for carrying the photomask 1; the carrying mechanism 20 is used to carry the carrying mechanism 10 To the inspection position; the rotating mechanism 30 is arranged at the inspection position, comprising a frame 31, a rotating frame 32 rotatably arranged on the frame body on the frame 31, and a clamping assembly 40 arranged on the opposite side of the rotating fra...

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Abstract

The invention discloses a photo mask inspection machine, including a bearing mechanism, a conveying mechanism and a rotating mechanism set in the check position. The rotating mechanism comprises a frame, a rotary frame capable of rotatable erection on frame and several pairs of first clamping component set near the opposite sides of a rotating machine frame. The first clamping component can move toward the opposite side of the frame. The invention also discloses a method for detecting the photo mask inspection machine. The first clamping jaw can be clamped on the two opposite sides of the photo mask close to the frame through the bearing mechanism after handling the photo mask to the check position. Bearing mechanism of the photo mask can be freely taken out without affecting the inspection. The actual holding position of the first clamping jaw is adjustable, thereby checking a variety of specifications of the photo mask without mask slippage is feasible. Furthermore, the second clamping component is settled on the other two side which clamp the photo mask after the bearing mechanism exit. The second clamping component ensure the reliability of the photo mask clamping and protect the photo mask from damage commendably.

Description

technical field [0001] The invention relates to the technical field of photomask inspection, in particular to a photomask inspection machine and an inspection method thereof. Background technique [0002] Mask inspection machine, English name Mask Cleaner, this device can hold the mask, check the particles (Particle) on the mask with a strong light, at the same time, clean it with an air gun to prevent the mask from being damaged by the particles (Mask Defect) . [0003] Both the front and back of the photomask need to be cleaned with particles, so the cleaning range of the equipment is required to be as large as possible; in addition, the production conditions have very high requirements on the cleanliness and quality of the photomask, and no scratches or damage are allowed, otherwise the photomask will be damaged. Unusable, directly affecting the production of the entire factory. [0004] At present, there are roughly two types of traditional photomask inspection machine...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): G03F1/84G01N21/94
CPCG01N21/94G03F1/84
Inventor张贺
OwnerWUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD