A method for preparing a surface anti-reflective self-cleaning structure

A self-cleaning, glass surface technology, applied in the field of surface anti-reflection self-cleaning structure preparation, can solve the problems of anti-reflection and self-cleaning of civil solar cells, etc., achieve obvious anti-reflection effect, improve anti-reflection effect, and increase the number of launches Effect

Inactive Publication Date: 2019-03-08
NORTH CHINA ELECTRIC POWER UNIV (BAODING)
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, neither of the two methods can achieve both anti-reflection and self-cleaning functions on the surface of civilian solar cells.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for preparing a surface anti-reflective self-cleaning structure
  • A method for preparing a surface anti-reflective self-cleaning structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] This embodiment relates to a method for preparing an anti-reflective self-cleaning surface structure, including surface electron beam etching and infiltration erosion; surface electron beam etching is to bombard the surface of cerium glass with electron beams, and perform nanoscale grid division on the surface of cerium glass. Each grid is a square cylindrical convex body (such as figure 1 shown), the radial size is 65-80nm. The infiltration and erosion is to further corrode the root of the square columnar convex body after electron beam etching by configuring the etching solution to generate a T-shaped nano convex body structure (such as figure 2 shown). Specific steps are as follows:

[0031] S1. Perform pre-etching treatment on the cerium glass sample, which includes sequential ultrasonic cleaning with EC808 solvent (solvent temperature 45°C, ultrasonic frequency 50KH Z , ultrasonic power 9000W, processing time 8 minutes), WIN15 solvent ultrasonic (solvent temper...

Embodiment 2

[0037] This embodiment relates to a method for preparing an anti-reflective self-cleaning surface structure, including surface electron beam etching and infiltration erosion; surface electron beam etching is to bombard the surface of cerium glass with electron beams, and perform nanoscale grid division on the surface of cerium glass. Each grid is a square cylindrical convex body (such as figure 1 shown), the radial size is 50-65nm. The infiltration and erosion is to further corrode the root of the square columnar convex body after electron beam etching by configuring the etching solution to generate a T-shaped nano convex body structure (such as figure 2 shown). Specific steps are as follows:

[0038] S1. Carry out etching pretreatment on cerium glass sample, this pretreatment includes carrying out EC808 solvent ultrasonic cleaning in sequence (solvent temperature 40 ℃, ultrasonic frequency 40KH Z , ultrasonic power 800W, processing time 10 minutes), WIN15 solvent ultrason...

Embodiment 3

[0044] This embodiment relates to a method for preparing an anti-reflective self-cleaning surface structure, including surface electron beam etching and infiltration erosion; surface electron beam etching is to bombard the surface of cerium glass with electron beams, and perform nanoscale grid division on the surface of cerium glass. Each grid is a square cylindrical convex body (such as figure 1 shown), the radial size is 80-100nm. The infiltration and erosion is to further corrode the root of the square columnar convex body after electron beam etching by configuring the etching liquid to generate a T-shaped nano convex body structure (such as figure 2 shown). Specific steps are as follows:

[0045] S1. Perform pre-etching treatment on the cerium glass sample, which includes sequential ultrasonic cleaning with EC808 solvent (solvent temperature 50°C, ultrasonic frequency 60KH Z , ultrasonic power 1000W, processing time 6 minutes), WIN15 solvent ultrasonic (solvent tempera...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
sizeaaaaaaaaaa
sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing a surface anti-reflection self-cleaning structure. The method for preparing the surface anti-reflection self-cleaning structure includes the steps of surface electron beam lithography and infiltration erosion, wherein in the step of surface electron beam lithography, electron beams are used for bombarding the surface of cerium glass, the surface of the cerium glass is subjected to nanoscale mesh division, each mesh is a square columnar protruding body with the radial size of 50-100 nm; in the step of infiltration erosion, an erosion solution is prepared and used for further corrosion to roots of the square columnar protruding bodies obtained after electron beam lithography to generate T-type nano protruding body structures; the erosion solution mainly comprises hydrofluoric acid, hydrogen peroxide and water. The surface anti-reflection self-cleaning structure has a nano T-type spatial structure, the proportion of transmitting light is increased after incident light is refracted many times in the nano T-type spatial structure, and transparency increasing is achieved. A nano gap structure on the surface has the hydrophobic characteristic and can achieve the self-cleaning function.

Description

technical field [0001] The invention relates to the technical field of anti-reflection self-cleaning surface structures, in particular to a method for preparing a surface anti-reflection self-cleaning structure. Background technique [0002] A solar cell is a device that converts light energy into electrical energy through the photoelectric conversion effect, so the absorptivity of the sun's incident light directly affects the output power of the solar cell. At present, during the use of solar cells such as vehicles, households, and photovoltaic power stations, the output power is not only limited by the properties of the battery itself, but also related to the daily operating environment conditions. The dust accumulation effect caused by natural conditions such as dust and rain, and the absorption caused by The drop in power is also one of the reasons for the drop in power. At present, research at home and abroad is mainly focused on two aspects, one is to realize the self...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & AuthorityPatents(China)
IPC IPC(8): C03C15/00C03C23/00
CPCC03C15/00C03C23/004
Inventor王简梁光胜唐悦燕富超闫永恒
OwnerNORTH CHINA ELECTRIC POWER UNIV (BAODING)