Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of high moisturizing makeup remover and its preparation process

A technology of makeup remover and mixture, which is applied in the field of high moisturizing makeup remover and its preparation technology, can solve the problems of skin irritation, low content of makeup remover active ingredients, and inability to achieve mild effect, etc., achieve good makeup remover effect, improve moisturizing effect, Good makeup remover

Active Publication Date: 2021-07-06
HANGZHOU XINYUE COSMETICS CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In the prior art, the content of water is extremely high, and the content of active ingredients for makeup remover is relatively low. Although it is relatively mild, it can be used for eye makeup removal, but the makeup removal effect for other parts of the face except the eyes is not ideal; In addition, it contains preservatives, which will cause certain irritation to the skin and cannot achieve a truly mild effect.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of high moisturizing makeup remover and its preparation process
  • A kind of high moisturizing makeup remover and its preparation process
  • A kind of high moisturizing makeup remover and its preparation process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] Embodiment 1: A kind of highly moisturizing makeup remover, the components included and the corresponding parts by weight are shown in Table 1, and are prepared through the following steps:

[0062] Step 1, fully mixing butylene glycol, dipropylene glycol, and diglycerin to obtain the first mixture;

[0063] Step 2, heating PEG-7 glyceryl cocoate, glyceryl polyether-26, and PEG-8 glyceryl isostearate to 75-85°C, and fully mixing to obtain the second mixture;

[0064] Step 3, adding caprylic acid / capric triglyceride and emollient to the second mixture obtained in step 2 to form a third mixture;

[0065] Step 4, add the third mixture obtained in step 3 to the first mixture obtained in step 1, mix thoroughly, and filter to obtain a high moisturizing makeup remover.

[0066] Among them, emollients

Embodiment 2-3

[0067] Example 2-3: a high moisturizing makeup remover, the difference from Example 1 is that the components included and their corresponding parts by weight are shown in Table 1.

Embodiment 4

[0068] Embodiment 4: a kind of highly moisturizing makeup remover, the difference with embodiment 1 is that the components included and the corresponding parts by weight are as shown in table 1. In step one add glycerin and mix well.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high moisturizing makeup remover and a preparation process thereof, belonging to the technical field of makeup removers. The high moisturizing makeup remover comprises the following components in parts by weight: 5-25 parts of butanediol; 2-8 parts of dipropylene glycol ; 1‑15 parts of diglycerin; 3‑20 parts of PEG‑7 glyceryl cocoate; 1‑8 parts of glyceryl polyethers‑26; 1‑18 parts of PEG‑8 glyceryl isostearate; Triglycerides 2‑25 parts; Emollients 2‑38 parts. The highly moisturizing makeup remover of the present invention has the advantages of good makeup remover effect, mildness and no irritation.

Description

technical field [0001] The invention relates to the technical field of makeup remover, more specifically, it relates to a high moisturizing makeup remover and its preparation process. Background technique [0002] On the one hand, makeup can increase the beauty of women and enhance their self-confidence. On the other hand, it also respects others in terms of social etiquette. [0003] At the same time, makeup removal is also a very important thing. Thoroughly cleansing the skin and removing makeup is the foundation of beauty. If it is not removed thoroughly, the residual cosmetics will cause the pores of the facial skin to be blocked, resulting in imbalanced secretion of oil, water and oil in the skin, thus Causes troublesome skin problems like acne, pimples and blackheads. At the same time, the residue of cosmetics is very harmful to the skin. If it cannot be cleaned in time, it will enter the hair follicles with the breathing of the pores and form cysts. It will be diffic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/86A61K8/34A61K8/37A61Q1/14A61Q19/00
CPCA61K8/345A61K8/375A61K8/86A61Q1/14A61Q19/00
Inventor 吴依娜张杭城宁德正陈国祥崇桂林
Owner HANGZHOU XINYUE COSMETICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com