High voltage diode and manufacturing method thereof

A technology of high-voltage diodes and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of difficulty in ensuring doping uniformity, thick drift region, and low doping concentration, and achieve the benefits of mass production Precise control of production and process parameters, and the effect of overcoming poor uniformity

Inactive Publication Date: 2019-05-21
泉州臻美智能科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to obtain a higher breakdown voltage, the thickness of the drift region of the high-voltage diode is usually very thick, and the doping concentration is very low
The traditional epitaxy technology cannot grow such a thick drift region on the substrate, and the traditional doping process is also difficult to ensure the uniformity of its doping

Method used

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  • High voltage diode and manufacturing method thereof
  • High voltage diode and manufacturing method thereof
  • High voltage diode and manufacturing method thereof

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Embodiment Construction

[0045] In order to make the objectives, technical solutions and beneficial effects of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments It is only a part of the embodiments of the present invention, but not all of them. Based on the implementation manners in the present invention, all other implementation manners obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention.

[0046] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings,...

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Abstract

The invention provides a manufacturing method of a high-voltage diode, which comprises the following steps: providing a first substrate of a first conductivity type and a second substrate of a secondconductivity type; extending upwards from the upper surface of the first substrate to form a first epitaxial layer of the second conductivity type, and extending upwards from the lower surface of thesecond substrate to form first sub-doped regions of the first conductivity type which are arranged at intervals; connecting the lower surface of the second substrate with the upper surface of the first epitaxial layer through a bonding process; extending downwards from the upper surface of the second substrate to form second sub-doped regions of the first conductivity type, and the first sub-dopedregions and the second sub-doped regions jointly forming a first doped region; extending upwards from the upper surface of the second substrate to form a second epitaxial layer of the second conductivity type; extending downward from the upper surface of the second epitaxial layer to form a second doped region of the second conductivity type; forming a front metal layer on the upper surface of the second doped region; and forming a back metal layer on the lower surface of the first substrate. The invention also provides a high-voltage diode.

Description

technical field [0001] The invention relates to the field of semiconductor chips, in particular to a high-voltage diode and a manufacturing method thereof. Background technique [0002] High-voltage diodes are usually able to withstand very high voltages, usually above 2000V, and can pass large currents. They are semiconductor devices that are widely used. According to different application occasions, high-voltage diodes have different requirements on their performance, so the focus of design is also different. When applied to ordinary rectification, high breakdown voltage and low forward voltage drop are required, and the requirements for reverse recovery characteristics are not very high. When applied to switching circuits, the switching speed is required to be high, so the key to design is to shorten the reverse recovery time and reduce the forward voltage drop. When applied to freewheeling circuits, not only must it have fast recovery speed and low forward voltage drop...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): H01L21/329H01L29/861H01L29/06
Inventor不公告发明人
Owner泉州臻美智能科技有限公司