The embodiment of the application provides a rigid workpiece bevel
exposure device, which is used for improving the precision of a
laser direct writing imaging device. The rigid workpiece is driven by a
harmonic reducer to perform linear stepping motion, and a
light source module performs linear scanning operation in the vertical direction of the linear stepping motion, without the
light source module moving in the
horizontal and vertical directions at the same time, thereby avoiding vertical position errors caused by multiple scanning motions and improving the precision of
exposure imaging. Secondly, the scanning motion carrier and the roller driving
system are both installed on the first bevel of the base, so that the feeding and discharging are both in the form of bevel feeding and discharging, thereby avoiding the rigid workpiece occupying too large horizontal space in the horizontal direction when feeding and discharging in the horizontal direction, and saving production space. Finally, the device adopts a
harmonic reducer as a transmission structure, which is small in size, light in weight and simple in structure, and the backlash of the
harmonic reducer is generally within 1 arc minute, so that the high-precision stepping of the rigid workpiece can be ensured, and the imaging precision is further improved.