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Method for growing silicon carbide single crystal by using high-density material block

A silicon carbide single crystal, high-density technology, applied in polycrystalline material growth, chemical instruments and methods, single crystal growth, etc., can solve problems such as crystal defects and poor thermal conductivity of powder materials

Active Publication Date: 2013-06-12
BEIJING CENTURY GOLDRAY SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Affected by the relative position of the crucible in the induction coil, and the thermal conductivity between the powders is poor, the remaining material is generally waist-shaped or cone-shaped in the middle, and the graphitization of the outside is serious
Moreover, the use of powder growth is easy to introduce impurities, which evaporate to the surface of the seed crystal during the high-temperature growth process, causing various crystal defects

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Use silicon carbide powder with a particle size of 0.6mm as the raw material, and the height of the material is 100mm. Place the crucible at an appropriate position, control the growth temperature at 2000-2300°C, fill it with Ar gas to 200Pa, and obtain a single crystal block after 24 hours of growth. (recorded as material block 1), 35mm high, 72mm in diameter; grow polycrystalline material block (recorded as material block 2) in the same way again, 30mm high, 72mm in diameter. Both blocks have a bulk density of 3.2 g / cm 3 , but the growth surface is uneven. After processing by surface grinder and cylindrical grinder, the height of material block 1 is 33mm, and the height of material block 2 is 26mm. Place the two blocks on the graphite pad (diameter 20mm, height 60mm) at the bottom of the crucible as raw materials, and grow silicon carbide single crystal by physical vapor transport method. The obtained crystal is 26 mm high and 78 mm in diameter, with good symmetry an...

Embodiment 2

[0021] Using silicon carbide powder with a particle size of 0.05mm as the raw material, it is compressed into a bulk density of 1.5 g / cm by isostatic pressing. 3 block of material. Three such blocks were placed on a graphite pad (30 mm in diameter and 5 mm in height) at the bottom of the crucible, and silicon carbide single crystals were grown by physical vapor transport. The obtained crystal is 20 mm high and 78 mm in diameter, with good symmetry and low single crystal impurity content (better transparency than the single crystal grown under the same conditions using powder).

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PUM

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Abstract

The invention discloses a method for growing a silicon carbide single crystal by using a high-density material block, belonging to the technical field of the preparation of semiconductor materials. The method comprises the steps of: (1) preparing a high-density silicon carbide material block, (2) underlaying the high-density silicon carbide material block in the step (1) with a cushion block to ensure that the material block is not in contact with a crucible, and placing the material block at the bottom of the crucible to be used as a raw material, and (3) placing a seed crystal at the top ofthe crucible, and growing the silicon carbide single crystal with a physical gaseous phase transmission method. The method solves the problem that powder is in direct contact with the crucible and realizes radiative heat transfer between the inner wall of the crucible and the aerial material block, the grown single crystal is uniform and symmetrical, and the content of impurities in the single crystal is greatly reduced.

Description

technical field [0001] The invention relates to a method for growing a silicon carbide single crystal, belonging to the technical field of semiconductor material preparation. Background technique [0002] As a wide bandgap semiconductor material, silicon carbide single crystal has excellent physical and electrical properties such as high thermal conductivity, high breakdown field strength, and high saturation electron drift rate. It is widely used in aerospace, ocean exploration, radar communication, and automotive electronics. The field has great application prospects. [0003] At present, the physical gas phase transport method is generally used for growing silicon carbide single crystals, that is, the raw materials are sublimated into gas phase substances in the high temperature area, and the gas phase substances are transported to the surface of the seed crystal with a certain distance from the surface of the raw material and at a lower temperature under the action of th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/36C30B23/02
Inventor 何丽娟吴星倪代秦李海飞赵岩
Owner BEIJING CENTURY GOLDRAY SEMICON CO LTD
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