Method for growing silicon carbide single crystal by using high-density material block
A silicon carbide single crystal, high-density technology, applied in polycrystalline material growth, chemical instruments and methods, single crystal growth, etc., can solve problems such as crystal defects and poor thermal conductivity of powder materials
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Embodiment 1
[0019] Use silicon carbide powder with a particle size of 0.6mm as the raw material, and the height of the material is 100mm. Place the crucible at an appropriate position, control the growth temperature at 2000-2300°C, fill it with Ar gas to 200Pa, and obtain a single crystal block after 24 hours of growth. (recorded as material block 1), 35mm high, 72mm in diameter; grow polycrystalline material block (recorded as material block 2) in the same way again, 30mm high, 72mm in diameter. Both blocks have a bulk density of 3.2 g / cm 3 , but the growth surface is uneven. After processing by surface grinder and cylindrical grinder, the height of material block 1 is 33mm, and the height of material block 2 is 26mm. Place the two blocks on the graphite pad (diameter 20mm, height 60mm) at the bottom of the crucible as raw materials, and grow silicon carbide single crystal by physical vapor transport method. The obtained crystal is 26 mm high and 78 mm in diameter, with good symmetry an...
Embodiment 2
[0021] Using silicon carbide powder with a particle size of 0.05mm as the raw material, it is compressed into a bulk density of 1.5 g / cm by isostatic pressing. 3 block of material. Three such blocks were placed on a graphite pad (30 mm in diameter and 5 mm in height) at the bottom of the crucible, and silicon carbide single crystals were grown by physical vapor transport. The obtained crystal is 20 mm high and 78 mm in diameter, with good symmetry and low single crystal impurity content (better transparency than the single crystal grown under the same conditions using powder).
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