Method for manufacturing metal doped full space or quasi-full space photonic crystal

A technology of photonic crystals and manufacturing methods, which is applied in the field of optoelectronics and can solve problems such as the difficulty in developing the full-space forbidden band in depth

Inactive Publication Date: 2012-08-08
NORTH CHINA ELECTRIC POWER UNIV (BAODING)
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Problems solved by technology

In the study of the full-space bandgap, people's main attention is on the search for special materials and various complex structures that are difficult to achieve at present, such as high refractive index, magnetism, and negative refractive index. Encountered great difficulties in the in-depth development of

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Embodiment Construction

[0008] The metal-doped full-space or quasi-full-space photonic crystal manufacturing method of the present invention comprises the following steps:

[0009] 1. In the process of making photoresist, use nano-intercalation method to dope nano-metal into photoresist;

[0010] 2. Spin the photoresist doped with the above-mentioned nanometer metal on the substrate to obtain the substrate with glue required for preparing the photonic crystal;

[0011] 3. Use the above glued substrate to prepare the photonic crystal.

[0012] The nano-metals doped include metal nanoparticles such as nano-Au, Ag, Al, etc., and can also be nano-metal oxides, such as TiO 2 , ZnO, In 2 o 3 , SnO 2 、Cr 2 o 3 , ZrO 2 、 Ta 2 o 5 , NbO, Nb 2 o 3 , Nb 2 o 5 . The doping ratio of the aforementioned nano-metals can be changed according to different doping substances, provided that the photosensitive properties of the photoresist are not affected. Among them, In is preferred 2 o 3 , which has th...

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Abstract

The invention discloses a method for manufacturing a metal-doped full space or quasi-full space photonic crystal. The method comprises the following steps of: 1) doping nano-metal into photoresist by a nano-intercalation method in the process of manufacturing the photoresist; 2) spin-coating the nano-metal doped photoresist on a substrate so as to obtain a photoresist-containing substrate which is required for preparing the photonic crystal; and 3), preparing the photonic crystal by using the photoresist-containing substrate.

Description

technical field [0001] The invention relates to a full-space or quasi-full-space photonic crystal, which belongs to the technical field of optoelectronics. Background technique [0002] There is a basic material in the photonic industry - photonic crystals. The research on photonic crystals is not only a problem in the field of optical communication, but it will also have a huge impact on other related industries. Since Yablonowitch and John independently proposed the concepts of photonic crystals and photonic band gaps in 1987, photonic crystals have become a hot topic that has received great attention both at home and abroad. In the fields of optical physics, condensed matter physics, electromagnetic waves, and information technology aroused widespread concern. In just two decades, photonic crystals have achieved remarkable results in both theoretical research and experimental research, and have also been applied in certain fields, such as photonic crystal optical integra...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G03F7/00G03F7/004
Inventor任芝李松涛
OwnerNORTH CHINA ELECTRIC POWER UNIV (BAODING)