Plasma treatment of corn seeds and supporting cultivation method

A technology for plasma and seed treatment, applied in the field of cultivation management measures, can solve problems such as lack of promotion, insufficient research on details of plasma treatment seeds, immature application technology of plasma treatment seeds, etc., so as to widen the area and increase the unit area. Yield, the effect of improving utilization
CN104255230BActive Publication Date: 2016-03-16李永青

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
李永青
Publication Date
2016-03-16
Patent Text Reader

Abstract

The invention discloses a plasma treatment corn seed and a matching cultivation method. The method of the invention is suitable for use in an ecological zone with an altitude of 33°-40° and an altitude of 700-1300 meters. The method for plasma treatment of corn seeds of the present invention is to use the DL-2 plasma treatment machine produced by Dalian Boshi Plasma Co., Ltd., the treatment dose is 1.6-2.0A, and the treatment is performed twice, and the seed flow rate is 5.0-5.5kg / min, sow seeds within 6-12 days after treatment. The cultivation method of the present invention is as follows: (1) selecting a variety in a suitable growth period; (2) fertilizing rationally; (3) watering in a timely manner. Compared with the prior art, adopting the method of the present invention can increase the yield per unit area of ​​corn by more than 30%; it can save 90 yuan per mu for plastic film covering; it can widen the range of corn cultivation, improve the utilization rate of ecological resources, and achieve the same soil fertility and cultivation The land with management costs can increase the income by more than 700 yuan per mu compared with the cultivation of naked oats. The invention is a highly practical technique for increasing corn production.
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Description

Technical field

[0001] The invention involves the field of corn cultivation technology, which specifically involves the application of corn seeds to treat corn seeds and use supporting cultivation management measures to achieve the purpose of high yield. Background technique

[0002] Plashes are a state of material existence.It is the fourth state after the state of material solid, liquid state, and gas state -plasma state.In 1929, scientists introduced the name "plasma" for the first time, and the plasma discipline became a young discipline.The application of plasma technology in agriculture is just the beginning. It has opened up a new field of plasma applications, and has also created a new way for agricultural production.The mechanism of plasma seed treatment technology is to act on seeds through the various energy emitted by plasma, stimulate the potential of seeds, improve the vitality of the seeds, enhance the robustness of the seeds, and improve the growth ability of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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