Plasma treatment of corn seeds and supporting cultivation method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 李永青
- Publication Date
- 2016-03-16
Abstract
Description
Technical field
[0001] The invention involves the field of corn cultivation technology, which specifically involves the application of corn seeds to treat corn seeds and use supporting cultivation management measures to achieve the purpose of high yield. Background technique
[0002] Plashes are a state of material existence.It is the fourth state after the state of material solid, liquid state, and gas state -plasma state.In 1929, scientists introduced the name "plasma" for the first time, and the plasma discipline became a young discipline.The application of plasma technology in agriculture is just the beginning. It has opened up a new field of plasma applications, and has also created a new way for agricultural production.The mechanism of plasma seed treatment technology is to act on seeds through the various energy emitted by plasma, stimulate the potential of seeds, improve the vitality of the seeds, enhance the robustness of the seeds, and improve the growth ability of the ...