A kind of miRNA related to plant response to drought stress——ghr-mir17 and its application

A drought stress, plant technology, applied in the field of new miRNA, can solve problems such as reduced yield, increased bud shedding, and photosynthesis effects

Inactive Publication Date: 2019-03-12
SHIJIAZHUANG ACADEMY OF AGRI & FORESTRY SCI
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, under drought stress, the stomata of cotton leaves are partially or completely closed, photosynthesis is affected, bud shedding increases, and yield decreases.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of miRNA related to plant response to drought stress——ghr-mir17 and its application
  • A kind of miRNA related to plant response to drought stress——ghr-mir17 and its application
  • A kind of miRNA related to plant response to drought stress——ghr-mir17 and its application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Example 1: Solexa sequencing analysis verifies the role of ghr-miR17 in the drought resistance mechanism of cotton

[0028] 1. Material cultivation and drought treatment: Shizao No. 1 cotton seeds were sown in culture pots with a 3:1 mixture of vermiculite and nutrient soil at a temperature of 28 °C and a relative humidity of 70%. The control materials were watered on the 7th, 14th, 21st, and 28th days after sowing, respectively, and watered 150 mL each time. On the 35th day, young leaves were taken, frozen in liquid nitrogen, and stored at -80 ℃; Water on 7, 14, and 21, 150 mL each time, take the young leaves on the 35th day, freeze in liquid nitrogen, and store at -80 ℃.

[0029] 2. Solexa sequencing analysis and identification of new miRNA: The samples obtained in the previous step were sent to Shanghai Meiji Biological Company for solexa sequencing and analysis. see figure 1 , the results showed that the expression number of ghr-miR17 was 83 under normal growth co...

Embodiment 2

[0030] Example 2: Real-time fluorescent quantitative PCR (Real-time PCR) analysis to verify the role of ghr-miR17 in the drought resistance mechanism of cotton

[0031] 1. Material cultivation and NaCl treatment

[0032]Shizao No. 1 cotton seeds were sown in culture pots mixed with vermiculite and nutrient soil at a ratio of 3:1, the temperature was 28 °C, and the relative humidity was 70%. The control materials were watered on the 7th, 14th, 21st, and 28th days after sowing, respectively, and watered 150 mL each time. On the 35th day, young leaves were taken, frozen in liquid nitrogen, and stored at -80 ℃; Water on 7, 14, and 21, 150 mL each time, take young leaves on the 35th day, freeze in liquid nitrogen, and store at -80°C.

[0033] 2. Isolation of RNA

[0034] Total RNA was extracted with the polysaccharide polyphenol plant total RNA extraction kit (catalogue number: DP441) from GIANGEN, and the extraction method was as follows:

[0035] 1. Homogenization treatment. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a miRNA related to plant response to drought stress—ghr-miR17, which has a nucleotide sequence shown in SEQ ID NO: 1, and its precursor sequence is shown in SEQ ID NO: 3, and its precursor sequence is shown in SEQ ID NO: 3. The coding gene of the body sequence is shown in SEQ ID NO:4. The drought resistance of cotton can be analyzed and adjusted by using the miRNA of the invention, which has practical application significance for the experimental research of cotton response to environmental stress and the cultivation of excellent cotton crop varieties.

Description

technical field [0001] The present invention relates to a new miRNA related to drought resistance, especially a new miRNA derived from cotton that can be used to analyze and regulate the drought resistance of cotton; the present invention also relates to the precursor of this miRNA, the coding gene of its precursor and its use. Background technique [0002] Abiotic stress affects the growth and development of plants and the yield of crops. Drought stress is one of the important abiotic stresses. Under drought stress, the cotton root system extended to the deep soil layer, the main stem and fruiting branches of the aboveground part were inhibited, the internodes were shortened, the plant became smaller, and the root-to-shoot ratio increased. In addition, under drought stress, the stomata of cotton leaves are partially or completely closed, photosynthesis is affected, bud shedding increases, and yield decreases. The arable and semi-arid areas of the world have a total of abo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C12N15/113C12N15/11C12Q1/6895
CPCC12N15/113C12N2310/141C12Q1/6895C12Q2600/13C12Q2600/158C12Q2600/178
Inventor 董章辉朱青竹赵丽芬眭书祥李增书张艳丽王虎
Owner SHIJIAZHUANG ACADEMY OF AGRI & FORESTRY SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap