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A device for detecting liquid waste discharge in a process unit

A detection device and liquid accumulation technology, applied in electrical components, semiconductor/solid-state device testing/measurement, circuits, etc., can solve the problem that chemical waste liquid cannot be drained in time, and achieve the effect of preventing splashing and preventing liquid leakage

Active Publication Date: 2018-10-09
SHENYANG KINGSEMI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the above-mentioned problems caused by the inability to discharge the chemical waste liquid in the unit in time, the purpose of the present invention is to provide a device for detecting waste liquid in the process unit

Method used

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  • A device for detecting liquid waste discharge in a process unit
  • A device for detecting liquid waste discharge in a process unit
  • A device for detecting liquid waste discharge in a process unit

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Embodiment Construction

[0018] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0019] Such as figure 1 , figure 2 As shown, the present invention includes an upper cover 1, an inner cover 2, a lower cover 3, a first partition 4, a liquid accumulation box 8, an inner cover 9 and a liquid accumulation sensor 10, wherein the first partition 4 is installed in the working area of ​​the process unit. On the platform, a motor 7 fixed on the workbench of the process unit is provided under the first partition 4. The output end of the motor 7 is connected to one end of the vacuum bracket 5 connected to the factory vacuum, and the other end of the vacuum bracket 5 One end passes through the first partition 4 to hold the wafer 6; the motor 7 provides a power source to drive the vacuum bracket 5 and the wafer 6 to rotate.

[0020] The lower cover 3 is installed on the workbench of the process unit and is located outside the first partition 4 . T...

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Abstract

The invention relates to a waste accumulated liquid drainage detecting device for a process unit. A lower cover and partitions are respectively mounted on a working table of the process unit, the first partition is positioned on the inner side of the lower cover, one end of an inner cover is hung on the first partition while the other end of the inner cover is abutted to the lower cover, an upper cover is positioned on the outer side of the inner cover and is inserted in the lower cover; and a flow guide cavity is formed between the upper cover and the inner cover; the lower cover is connected with an accumulated liquid box, an inner sleeve is placed in the accumulated liquid box, an accumulated liquid feedback cavity is formed between the inner sleeve and the inner wall of the accumulated liquid box, and the lower cover below the flow guide cavity communicates with the inside of the inner sleeve to form a liquid drainage flow channel; and the upper end of the inner sleeve is connected with a lower sleeve in an inserted manner, a plurality of openings through while the liquid drainage flow channel communicates with the accumulated liquid feedback cavity are uniformly distributed in the lower end of the inner sleeve in the peripheral direction, and an accumulated liquid sensor which extends into the accumulated liquid feedback cavity is arranged on the accumulated liquid box. Liquid accumulation and liquid leakage which are caused by the reason that waste liquid is condensed or a pipeline is unsmooth can be prevented well, and the purpose of early warning is achieved by triggering the accumulated liquid sensor.

Description

technical field [0001] The invention relates to the detection of the problem of waste liquid accumulation generated during the wafer process in a process unit, in particular to a detection device for waste liquid accumulation in a process unit. Background technique [0002] At present, when a wafer is processed in a process unit, the microenvironment inside the unit is very important to the process, and a slight change in the internal environment will also affect the wafer yield. If the chemical waste liquid in the unit cannot be discharged in time, it will cause volatilization, which will lead to changes in the entire internal environment and affect the subsequent process, and serious unqualified glue removal and redoing. This consequence is fatal to the customer. Contents of the invention [0003] In order to solve the above-mentioned problems caused by the inability to discharge the waste liquid of chemicals in the unit in time, the object of the present invention is t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/66
CPCH01L21/67017H01L21/67253
Inventor 王丽鹤
Owner SHENYANG KINGSEMI CO LTD
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