Determining method, information processing apparatus, exposure apparatus and article manufacturing method

An information processing device, a technology for determining a method, applied in the field of article manufacturing, capable of solving problems such as unsatisfactory, inability to easily adjust the amount of aberration, etc.

Active Publication Date: 2017-12-08
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Of these aberrations, coma aberration, astigmatism, and distortion can be reduced by using correcting optical elements such as a correcting plate arranged inside the projection optical system, but there is no easy way to reduce aberrations in the 4nθ system such as the 4θ system. How to adjust the amount of aberration
The aberration of the 4nθ system causes a shift between the focal positions of the vertical pattern and the horizontal pattern and the focal position of the pattern in the oblique direction, so it becomes the cause of such a difference in the line width of the pattern depending on the direction, and does not make the people are satisfied

Method used

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  • Determining method, information processing apparatus, exposure apparatus and article manufacturing method
  • Determining method, information processing apparatus, exposure apparatus and article manufacturing method
  • Determining method, information processing apparatus, exposure apparatus and article manufacturing method

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Embodiment Construction

[0023] Hereinafter, exemplary embodiments of the present invention will be described with reference to the drawings.

[0024] figure 1 The structure of the exposure apparatus 1 which concerns on one Embodiment of this invention is shown. The exposure apparatus 1 may include an illumination optical system 100 , a projection optical system 200 , a master drive mechanism MD, a substrate drive mechanism SD, a control unit 300 , a console 400 , and a calculation unit 500 . The exposure apparatus 1 exposes the substrate P by illuminating the original plate M with the illumination optical system 100 and projecting an image of the pattern of the original plate M onto the substrate P with the projection optical system 200 . The exposure device 1 can be configured, for example, as a scanning exposure device that transfers the pattern of the original plate M to the substrate P while scanning the original plate by the original plate drive mechanism MD and scanning the substrate by the su...

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Abstract

The invention relates to a determining method, an information processing apparatus, an exposure apparatus and an article manufacturing method, wherein, the determining method is used to determine the exposure condition of the exposure apparatus; the exposure apparatus is used to expose a substrate by projecting an original pattern onto the substrage by a projecting optical system; and the determining method comprises the steps of setting a procedure, namely setting components of the multiple components of wavefront aberration of the projection optical system that is expressed by f( r) cos (4n theta) and f( r) sin (4n theta) by setting (r, theta) as polar coordinate and n as a natural number, and f( r) as function of r; the method also comprises a determining procedure, namely determining the exposure condition to focus a focus sensitivity of the variant of the focusing position determined by the component in a target scope.

Description

technical field [0001] The present invention relates to a method for determining exposure conditions, a storage medium, an information processing device, an exposure device, and an article manufacturing method. Background technique [0002] Displays such as liquid crystal panels and organic EL panels are manufactured through a photolithography process in which a pattern of an original plate (also referred to as a mask or reticle) is transferred to a substrate by an exposure device (the substrate is exposed through the pattern). In recent years, in particular, there has been an increasing demand for high-definition displays embedded in smartphones, tablet terminals, and the like, and therefore high resolution is required for exposure apparatuses. [0003] Assuming that the numerical aperture of the projection optical system is NA, the wavelength of exposure light is λ, and a constant (k1 factor) depending on the exposure process is k1, the resolution of the exposure apparatus...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): G03F7/20
CPCG03F7/705G03F7/70258G03F7/70266G03F7/70275
Inventor永井善之
OwnerCANON KK